SCHEMBL12994272

SCHEMBL12994272

CNC(=O)c1cc(-c2ccc(C(=O)O)c(C(=O)Nc3ccc(-c4ccc(C)cc4C(F)(F)F)c(C(F)(F)F)c3)c2)ccc1C(=O)O

nearest known ligand 0.47

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ S1PR1 P21453 15/20 0.47
▸ S1PR3 Q99500 8/20 0.47
▸ MEN1 O00255 2/20 0.43
▸ KMT2A Q03164 2/20 0.43
▸ NPC1 O15118 1/20 0.43
▸ MAPT P10636 1/20 0.43
▸ HTT P42858 1/20 0.43
▸ RAB9A P51151 1/20 0.43
▸ NPSR1 Q6W5P4 1/20 0.43
▸ ALDH1A1 P00352 1/20 0.42
▸ KCNK3 O14649 1/20 0.40
▸ KCNK9 Q9NPC2 1/20 0.40
▸ KDR P35968 1/20 0.40
▸ PTGDR2 Q9Y5Y4 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17827630 0.91 S1PR1 (0.45) S1PR1S1PR3MEN1KMT2ANPC1
SCHEMBL10024745 0.88 SORT1 (0.44) S1PR1S1PR3MEN1KMT2ANPC1
SCHEMBL16263581 0.86 S1PR1 (0.46) S1PR1S1PR3MEN1KMT2ANPC1
SCHEMBL12994264 0.86 S1PR1 (0.39) S1PR1S1PR3MEN1KMT2ANPC1
SCHEMBL12605304 0.86 POLB (0.43) S1PR1S1PR3KMT2AMAPTALDH1A1
SCHEMBL14370475 0.82 STK39 (0.41) MEN1KMT2AMAPTHTTRAB9A
SCHEMBL9885179 0.81 MCL1 (0.49) MEN1KMT2ANPC1MAPTHTT
SCHEMBL25800414 0.81 MAPT (0.59) MEN1KMT2ANPC1MAPTHTT
SCHEMBL12172808 0.79 TAS2R14 (0.55) S1PR1S1PR3MEN1KMT2ANPC1
SCHEMBL25800418 0.79 RAB9A (0.63) MEN1KMT2ANPC1MAPTHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8728705-B2 Negative photosensitive material, photosensitive board employing the negative photosensitive material, and negative pattern forming method NITTO DENKO CORPORATION (JP) 2014-05-20 — — US disclosed
US-20100304298-A1 NEGATIVE PHOTOSENSITIVE MATERIAL, PHOTOSENSITIVE BOARD EMPLOYING THE NEGATIVE PHOTOSENSITIVE MATERIAL, AND NEGATIVE PATTERN FORMING METHOD NITTO DENKO CORPORATION (JP) 2010-12-02 — — US disclosed
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