SCHEMBL12997352

SCHEMBL12997352

Bc1ccc(-c2nc(-c3ccccc3)nc(-c3ccc(OC)cc3O)n2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 4/20 0.54
MAPT P10636 5/20 0.49
MEN1 O00255 4/20 0.49
KMT2A Q03164 4/20 0.49
SMN1; SMN2 Q16637 3/20 0.49
RAB9A P51151 2/20 0.49
NFKB1 P19838 1/20 0.49
NFKB2 Q00653 1/20 0.49
RELA Q04206 1/20 0.49
PTPN1 P18031 1/20 0.49
NCOA1 Q15788 2/20 0.48
NCOA3 Q9Y6Q9 2/20 0.48
BACE1 P56817 1/20 0.48
IDH1 O75874 1/20 0.47
HTT P42858 3/20 0.46
ALDH1A1 P00352 2/20 0.46
TP53 P04637 2/20 0.46
KDM4E B2RXH2 2/20 0.46
HSD17B10 Q99714 1/20 0.46
TDP1 Q9NUW8 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15910010 0.92 NPC1 (0.59) NPC1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL807727 0.92 NPC1 (0.59) NPC1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL195208 0.92 NPC1 (0.59) NPC1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL39669 0.92 NPC1 (0.62) NPC1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL29353657 0.92 NPC1 (0.62) NPC1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL17920176 0.92 NPC1 (0.62) NPC1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL17571546 0.87 TSHR (0.59) NPC1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL12997145 0.86 NPC1 (0.54) NPC1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL13938599 0.86 NPC1 (0.61) NPC1MAPTMEN1KMT2ASMN1; SMN2
SCHEMBL12228367 0.86 NPC1 (0.54) NPC1MAPTMEN1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2261279-A1 Triazine derivative, ultraviolet absorber composition and resin composition stabilized with the absorber composition Fujifilm Corporation (JP) 2010-12-15 EP disclosed