SCHEMBL12997403

SCHEMBL12997403

C=CC(C)(C=C)C(C)(C)C(C)(C)CCCn1c(=O)n(CCCC(C)(C)C)c(=O)n(CCCC(C)(C)C)c1=O

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12997402 0.87 CYP3A4 (0.31) CYP3A4
SCHEMBL12997397 0.80 RGS4 (0.37)
SCHEMBL12997387 0.79 RGS4 (0.33)
SCHEMBL14226996 0.78 CYP3A4 (0.57) CYP3A4
SCHEMBL12997390 0.75 CYP3A4 (0.37) CYP3A4
SCHEMBL14227019 0.73 CYP3A4 (0.50) CYP3A4
SCHEMBL15984388 0.73 RGS4 (0.35)
SCHEMBL14226992 0.71 GRM2 (0.36)
SCHEMBL19493727 0.70 CYP3A4 (0.50) CYP3A4
SCHEMBL25867919 0.68 RGS4 (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8426112-B2 Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2013-04-23 US disclosed
US-20100304305-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING POLYMER HAVING NITROGEN-CONTAINING SILYL GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-02 US disclosed