SCHEMBL12997397

SCHEMBL12997397

CC(C)(C)CCCn1c(=O)n(CCCC(C)(C)C)c(=O)n(CCCC(C)(C)C)c1=O

nearest known ligand 0.39

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
RGS4 P49798 3/20 0.37
DAO P14920 1/20 0.35
GRM2 Q14416 2/20 0.32
GSK3B P49841 1/20 0.31
RGS8 P57771 1/20 0.31
CNR2 P34972 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15984388 0.91 RGS4 (0.35) RGS4DAOCNR2
SCHEMBL12997387 0.89 RGS4 (0.33) RGS4DAO
SCHEMBL14226992 0.89 GRM2 (0.36) RGS4DAOGRM2RGS8
SCHEMBL25867919 0.85 RGS4 (0.43) RGS4GSK3BRGS8CNR2
SCHEMBL14226996 0.84 CYP3A4 (0.57)
SCHEMBL22152939 0.84 DAO (0.42) RGS4DAOGRM2GSK3BRGS8
SCHEMBL19336853 0.83 ADORA2B (0.43) RGS4GSK3BRGS8CNR2
SCHEMBL14226991 0.82 TP53 (0.60)
SCHEMBL12997402 0.80 CYP3A4 (0.31)
SCHEMBL12997403 0.80 CYP3A4 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022140621-A1 CHEMICALLY HOMOGENEOUS SILICON HARDMASKS FOR LITHOGRAPHY BREWER SCIENCE, INC. (US) 2022-06-30 WO disclosed
US-20220195238-A1 CHEMICALLY HOMOGENEOUS SILICON HARDMASKS FOR LITHOGRAPHY BREWER SCIENCE, INC. 2022-06-23 US disclosed
US-9023588-B2 Resist underlayer film forming composition containing silicon having nitrogen-containing ring NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-05-05 US disclosed
US-8426112-B2 Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2013-04-23 US disclosed
US-20120315765-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING NITROGEN-CONTAINING RING NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-12-13 US disclosed
US-20100304305-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING POLYMER HAVING NITROGEN-CONTAINING SILYL GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120315765-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING NITROGEN-CONTAINING RING SRSF1, SRSF7, SRRM2 RGS4 2843/4885DAO 4495/4885GRM2 3256/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.