SCHEMBL13027199

SCHEMBL13027199

CCO[Si](OCC)(OCC)c1c(C)ccc(CO)c1OC

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 1/20 0.32
▸ PDCD1 Q15116 1/20 0.31
▸ CD274 Q9NZQ7 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027122 0.87 PDCD1 (0.36) MAPTPDCD1CD274
SCHEMBL13027166 0.83 ACSS2 (0.31) —
SCHEMBL13027339 0.76 MAPT (0.30) MAPT
SCHEMBL13027188 0.72 MAPT (0.33) MAPT
SCHEMBL13027160 0.70 TSHR (0.32) MAPT
SCHEMBL13027136 0.70 CYP1A2 (0.31) MAPT
SCHEMBL17655651 0.69 MAPT (0.37) MAPTPDCD1CD274
SCHEMBL13027182 0.68 ACSS2 (0.31) —
SCHEMBL5552250 0.68 CYP1A2 (0.39) MAPT
SCHEMBL13027315 0.68 AGXT (0.32) MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8697330-B2 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-15 — — US disclosed
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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