SCHEMBL13027339

SCHEMBL13027339

CCO[Si](Cc1c(C)ccc(CO)c1OC)(OCC)OCC

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027268 0.86 PDCD1 (0.34) MAPT
SCHEMBL13027319 0.84 ACSS2 (0.30) —
SCHEMBL13027370 0.76 ALDH1A1 (0.33) MAPT
SCHEMBL15672365 0.76 PDCD1 (0.33) MAPT
SCHEMBL13027199 0.76 MAPT (0.32) MAPT
SCHEMBL13027322 0.75 MAPT (0.30) MAPT
SCHEMBL13027315 0.75 AGXT (0.32) MAPT
SCHEMBL13027333 0.74 HTT (0.34) MAPT
SCHEMBL13027297 0.72 MEN1 (0.31) MAPT
SCHEMBL13027314 0.72 TSHR (0.31) MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8697330-B2 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-15 — — US disclosed
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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