SCHEMBL13027319

SCHEMBL13027319

CCO[Si](Cc1c(C)ccc(C)c1OC)(OCC)OCC

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ ACSS2 Q9NR19 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027333 0.88 HTT (0.34) —
SCHEMBL13027339 0.84 MAPT (0.30) —
SCHEMBL13027245 0.83 ADRA2A (0.31) —
SCHEMBL15672404 0.83 — —
SCHEMBL13027370 0.81 ALDH1A1 (0.33) —
SCHEMBL13027297 0.79 MEN1 (0.31) —
SCHEMBL13027315 0.79 AGXT (0.32) —
SCHEMBL13027314 0.79 TSHR (0.31) —
SCHEMBL13027302 0.77 TAAR1 (0.34) —
SCHEMBL13027322 0.76 MAPT (0.30) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8697330-B2 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-15 — — US disclosed
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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