SCHEMBL13027245

SCHEMBL13027245

COc1c(C)ccc(C)c1C[Si](OC)(OC)OC

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ ADRA2A P08913 1/20 0.31
▸ ADRA1A P35348 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027257 0.87 ALDH1A1 (0.34) —
SCHEMBL13027319 0.83 ACSS2 (0.30) —
SCHEMBL13027268 0.83 PDCD1 (0.34) —
SCHEMBL13027413 0.82 — —
SCHEMBL13027225 0.79 CYP1A2 (0.31) —
SCHEMBL13027288 0.78 ALDH1A1 (0.36) ADRA2AADRA1A
SCHEMBL13027241 0.77 AGXT (0.34) —
SCHEMBL13027238 0.77 TSHR (0.33) —
SCHEMBL13027226 0.77 TAAR1 (0.36) —
SCHEMBL15672392 0.74 ALDH1A1 (0.33) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8697330-B2 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-15 — — US disclosed
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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