SCHEMBL13027502

SCHEMBL13027502

C#CO[Si](CCc1ccccc1C)(OC#C)OC#C

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TAAR1 Q96RJ0 1/20 0.44
▸ DAO P14920 2/20 0.35
▸ P2RX7 Q99572 1/20 0.34
▸ CA12 O43570 1/20 0.33
▸ CA1 P00915 1/20 0.33
▸ CA2 P00918 1/20 0.33
▸ CA7 P43166 1/20 0.33
▸ CA9 Q16790 1/20 0.33
▸ CA14 Q9ULX7 1/20 0.33
▸ ALDH1A1 P00352 2/20 0.33
▸ HPGD P15428 2/20 0.33
▸ ADRA2A P08913 1/20 0.33
▸ ADRA2B P18089 1/20 0.33
▸ ADRA2C P18825 1/20 0.33
▸ CYP11B1 P15538 1/20 0.33
▸ CYP11B2 P19099 1/20 0.33
▸ MEN1 O00255 2/20 0.32
▸ KMT2A Q03164 2/20 0.32
▸ MAPT P10636 1/20 0.32
▸ ALOX12 P18054 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027501 0.87 P2RX7 (0.34) TAAR1P2RX7MEN1KMT2AMAPT
SCHEMBL13027497 0.84 TAAR1 (0.31) TAAR1
SCHEMBL13027547 0.83 SCN8A (0.32) CA12CA1CA2CA14MEN1
SCHEMBL13027510 0.80 TAAR1 (0.47) TAAR1P2RX7MEN1KMT2AMAPT
SCHEMBL13027500 0.80 PYCR1 (0.43) TAAR1P2RX7ALDH1A1MEN1KMT2A
SCHEMBL13027624 0.80 TAAR1 (0.50) TAAR1CA12CA1CA2CA9
SCHEMBL2203418 0.78 TAAR1 (0.50) TAAR1DAOP2RX7CA12CA1
SCHEMBL13027519 0.78 — —
SCHEMBL13027494 0.77 NPSR1 (0.32) —
SCHEMBL13027486 0.76 TAAR1 (0.36) TAAR1MAPTCHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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