Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 1/20 | 0.43 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.38 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | KIF11 | P52732 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.32 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8905124 | 0.78 | CA2 (0.43) | CA2GABRA1GABRB2ALDH1A1TSHR | |
| SCHEMBL8905547 | 0.78 | CA2 (0.39) | CA2GABRA1GABRB2ALDH1A1TSHR | |
| SCHEMBL1304653 | 0.77 | GABRA1 (0.33) | GABRA1GABRB2ALDH1A1TSHRKDM4E | |
| SCHEMBL20268794 | 0.77 | CA2 (0.41) | CA2GABRA1GABRB2ALDH1A1TSHR | |
| SCHEMBL1033902 | 0.77 | SMN1; SMN2 (0.45) | CA2ALDH1A1SMN1; SMN2 | |
| SCHEMBL2855727 | 0.75 | CA2 (0.48) | CA2GABRA1GABRB2ALDH1A1TSHR | |
| SCHEMBL8905555 | 0.74 | CA2 (0.39) | CA2GABRA1GABRB2ALDH1A1TSHR | |
| Hydrochloric Acid SCHEMBL28500978 | 0.73 | CA2 (0.46) | CA2GABRA1GABRB2ALDH1A1TSHR | |
| SCHEMBL3096012 | 0.72 | CA2 (0.50) | CA2GABRA1GABRB2ALDH1A1TSHR | |
| SCHEMBL727580 | 0.71 | CA2 (0.44) | CA2GABRA1GABRB2ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0686647-B1 | Process for preparing methyl methacrylate with high level of syndiotactic triads | ATOCHEM ELF SA (FR) | 1998-01-28 | — | — | EP | claimed |
| US-5656704-A | POLYMETHYL METHACRYLATE; HIGH STRENGTH, HEAT RESISTANT, RADIATION TRANSPARENT | ELF ATOCHEM S.A. (FR) | 1997-08-12 | — | — | US | claimed |
| EP-3459980-B1 | FLUORINE-CONTAINING COPOLYMER | DAIKIN IND LTD (JP) | 2024-06-19 | — | — | EP | disclosed |
| US-11780946-B2 | Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-10 | — | — | US | disclosed |
| US-20210230332-A1 | ALTERNATING COPOLYMER, METHOD OF PRODUCING ALTERNATING COPOLYMER, METHOD OF PRODUCING POLYMERIC COMPOUND, AND METHOD OF FORMING RESIST PATTERN | NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT | 2021-07-29 | — | — | US | disclosed |
| EP-2921510-B1 | SURFACE TREATMENT COMPOSITION | DAIKIN IND LTD (JP) | 2019-10-02 | — | — | EP | disclosed |
| EP-3459980-A1 | FLUORINE-CONTAINING COPOLYMER | Daikin Industries, Ltd. (JP) | 2019-03-27 | — | — | EP | disclosed |
| US-20190002604-A1 | HETERORING-CONTAINING SILOXANE POLYMER, COMPOSITION CONTAINING SAID POLYMER, AND ELECTRONIC ELEMENT | DAINIPPON INK & CHEMICALS (JP) | 2019-01-03 | — | — | US | disclosed |
| US-20180223181-A1 | SILOXANE MONOMER, POLYMER THEREOF, COMPOSITION CONTAINING SAID POLYMER, AND ELECTRONIC ELEMENT | DAINIPPON INK & CHEMICALS (JP) | 2018-08-09 | — | — | US | disclosed |
| US-9951166-B2 | Fluorine-containing, silicon-containing polymer and surface treatment agent | DAIKIN INDUSTRIES, LTD. (JP) | 2018-04-24 | — | — | US | disclosed |
| US-9909027-B2 | Surface treatment composition | DAIKIN INDUSTRIES, LTD. (JP) | 2018-03-06 | — | — | US | disclosed |
| US-20080081290-A1 | RESIST COMPOSITION, RESIN FOR USE IN THE RESIST COMPOSITION, COMPOUND FOR USE IN THE SYNTHESIS OF THE RESIN, AND PATTERN-FORMING METHOD USING THE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| EP-1903394-A1 | Resist composition, resin for use in the resist composition, and pattern-forming method using the resist composition | FUJIFILM Corporation (JP) | 2008-03-26 | — | — | EP | disclosed |
| US-20060234154-A1 | Mixture containing acid generator and free radical catalyst; acrylated ester monomer | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060166136-A1 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-07-27 | — | — | US | disclosed |
| EP-1684119-A2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-07-26 | — | — | EP | disclosed |
| EP-1602975-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-12-07 | — | — | EP | disclosed |
| EP-0686647-B1 | Process for preparing methyl methacrylate with high level of syndiotactic triads | ATOCHEM ELF SA (FR) | 1998-01-28 | — | — | EP | disclosed |
| US-5656704-A | POLYMETHYL METHACRYLATE; HIGH STRENGTH, HEAT RESISTANT, RADIATION TRANSPARENT | ELF ATOCHEM S.A. (FR) | 1997-08-12 | — | — | US | disclosed |
| EP-0686647-A1 | Process for preparing methyl methacrylate with high level of syndiotactic triads | ELF ATOCHEM S.A. (FR) | 1995-12-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180223181-A1 | SILOXANE MONOMER, POLYMER THEREOF, COMPOSITION CONTAINING SAID POLYMER, AND ELECTRONIC ELEMENT | ILK, LIMA1, EED | CA2 3907/4885GABRA1 3851/4885GABRB2 4116/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.