Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 1/20 | 0.33 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | RXRA | P19793 | 3/20 | 0.31 |
| ▸ | PPARG | P37231 | 3/20 | 0.31 |
| ▸ | RARG | P13631 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
| ▸ | ATP2A2 | P16615 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | ATP2A3 | Q93084 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1033902 | 0.83 | SMN1; SMN2 (0.45) | CYP3A4CYP2C9CYP2C19POLBALDH1A1 | |
| SCHEMBL3678167 | 0.79 | CYP1A2 (0.33) | GABRA1GABRB2CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL26876686 | 0.78 | RARG (0.33) | GABRA1GABRB2CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL3682919 | 0.78 | GABRA1 (0.32) | GABRA1GABRB2CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL1304345 | 0.77 | CA2 (0.43) | GABRA1GABRB2TSHRKDM4EALDH1A1 | |
| SCHEMBL4246692 | 0.76 | RXRA (0.32) | CYP1A2CYP3A4CYP2C9TSHRCYP2C19 | |
| SCHEMBL4247017 | 0.76 | GABRA1 (0.37) | GABRA1GABRB2CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL3678171 | 0.75 | CYP1A2 (0.33) | GABRA1GABRB2CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL4246696 | 0.73 | RXRA (0.30) | RXRAPPARG | |
| SCHEMBL26875010 | 0.73 | CYP1A2 (0.36) | CYP1A2CYP3A4CYP2C9TSHRCYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3459980-B1 | FLUORINE-CONTAINING COPOLYMER | DAIKIN IND LTD (JP) | 2024-06-19 | — | — | EP | disclosed |
| US-11780946-B2 | Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-10 | — | — | US | disclosed |
| US-20210230332-A1 | ALTERNATING COPOLYMER, METHOD OF PRODUCING ALTERNATING COPOLYMER, METHOD OF PRODUCING POLYMERIC COMPOUND, AND METHOD OF FORMING RESIST PATTERN | NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT | 2021-07-29 | — | — | US | disclosed |
| EP-2921510-B1 | SURFACE TREATMENT COMPOSITION | DAIKIN IND LTD (JP) | 2019-10-02 | — | — | EP | disclosed |
| EP-3459980-A1 | FLUORINE-CONTAINING COPOLYMER | Daikin Industries, Ltd. (JP) | 2019-03-27 | — | — | EP | disclosed |
| US-9951166-B2 | Fluorine-containing, silicon-containing polymer and surface treatment agent | DAIKIN INDUSTRIES, LTD. (JP) | 2018-04-24 | — | — | US | disclosed |
| US-9909027-B2 | Surface treatment composition | DAIKIN INDUSTRIES, LTD. (JP) | 2018-03-06 | — | — | US | disclosed |
| EP-2749579-B1 | CONJUGATED DIENE POLYMER AND METHOD FOR PRODUCING SAME | ZEON CORP (JP) | 2017-11-15 | — | — | EP | disclosed |
| US-9745394-B2 | Conjugated diene polymer and method for producing same | ZEON CORPORATION (JP) | 2017-08-29 | — | — | US | disclosed |
| US-9696625-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-07-04 | — | — | US | disclosed |
| US-20140350201-A1 | CONJUGATED DIENE POLYMER AND METHOD FOR PRODUCING SAME | KYOTO UNIVERSITY (JP) | 2014-11-27 | — | — | US | disclosed |
| EP-2749579-A1 | CONJUGATED DIENE POLYMER AND METHOD FOR PRODUCING SAME | Zeon Corporation (JP) | 2014-07-02 | — | — | EP | disclosed |
| US-8053161-B2 | Improved in line edge roughness not only in ordinary exposure (dry exposure) but also in immersion exposure | FUJIFILM CORPORATION (JP) | 2011-11-08 | — | — | US | disclosed |
| US-7947421-B2 | Fluoropolymer containing unsaturated monomer with a adamantyl, decalin, norbornyl, cedrol , cyclohexyl, cycloheptyl, cyclooctyl , a cyclodecanyl, cyclododecanyl and/or tricyclodecanyl group; sulfonium type compound generates acid upon exposure to actinic radiation; semiconductor, integrated circuits | FUJIFILM CORPORATION (JP) | 2011-05-24 | — | — | US | disclosed |
| US-20080081290-A1 | RESIST COMPOSITION, RESIN FOR USE IN THE RESIST COMPOSITION, COMPOUND FOR USE IN THE SYNTHESIS OF THE RESIN, AND PATTERN-FORMING METHOD USING THE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| EP-1903394-A1 | Resist composition, resin for use in the resist composition, and pattern-forming method using the resist composition | FUJIFILM Corporation (JP) | 2008-03-26 | — | — | EP | disclosed |
| US-20060234154-A1 | Mixture containing acid generator and free radical catalyst; acrylated ester monomer | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060166136-A1 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-07-27 | — | — | US | disclosed |
| EP-1684119-A2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-07-26 | — | — | EP | disclosed |
| EP-1602975-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-12-07 | — | — | EP | disclosed |