SCHEMBL1305039

SCHEMBL1305039

C=CC(=O)CCCC[SiH](OC)OC

nearest known ligand 0.37

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.37
ALDH1A1 P00352 2/20 0.37
LMNA P02545 1/20 0.35
POLB P06746 1/20 0.33
POLA1 P09884 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.31
RECQL P46063 1/20 0.31
FAAH O00519 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29012034 0.98 ALDH1A1 (0.38) TSHRALDH1A1LMNAPOLBPOLA1
SCHEMBL28384139 0.94 ALDH1A1 (0.38) TSHRALDH1A1LMNAPOLBPOLA1
SCHEMBL1305242 0.81 TSHR (0.39) TSHRALDH1A1LMNAPOLBPOLA1
SCHEMBL29012002 0.80 TSHR (0.38) TSHRALDH1A1LMNAPOLBPOLA1
SCHEMBL6557587 0.76 ALDH1A1 (0.50) TSHRALDH1A1LMNASMN1; SMN2FAAH
SCHEMBL28419198 0.76 TSHR (0.40) TSHRALDH1A1
SCHEMBL3503026 0.75 ALDH1A1 (0.50) TSHRALDH1A1LMNA
SCHEMBL80819 0.74 TSHR (0.62) TSHRALDH1A1SMN1; SMN2
SCHEMBL5367622 0.74 ALDH1A1 (0.62) TSHRALDH1A1LMNAPOLBPOLA1
SCHEMBL23631357 0.73 TSHR (0.48) TSHRALDH1A1LMNASMN1; SMN2FAAH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120202243-A Thermosetting resin composition, cured film, substrate, and electronic component 捷恩智株式会社 2025-06-24 CN disclosed
WO-2024150597-A1 THERMOSETTING RESIN COMPOSITION, CURED FILM, SUBSTRATE, AND ELECTRONIC COMPONENT JNC株式会社 2024-07-18 WO disclosed
WO-2023182263-A1 PRODUCTION METHOD FOR LED-MOUNTED SUBSTRATE WITH CURED FILM 東レ株式会社 2023-09-28 WO disclosed
WO-2023157713-A1 RESIN COMPOSITION, LIGHT-BLOCKING FILM, METHOD FOR PRODUCING LIGHT-BLOCKING FILM, SUBSTRATE HAVING PARTITIONING WALL ATTACHED THERETO, AND DISPLAY DEVICE 東レ株式会社 2023-08-24 WO disclosed
WO-2023048062-A1 SILOXANE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, AND METHOD FOR PRODUCING POLYSILOXANE 東レ株式会社 2023-03-30 WO disclosed
WO-2023048016-A1 RESIN COMPOSITION, LIGHT-SHIELDING FILM, AND SUBSTRATE WITH PARTITIONING WALL 東レ株式会社 2023-03-30 WO disclosed
CN-110494469-B Thermosetting resin composition, cured film, substrate with cured film, electronic component, and ink for inkjet 捷恩智株式会社 2022-07-26 CN disclosed
CN-110546207-B Transparent resin composition, transparent coating film and transparent resin-coated glass substrate 东丽株式会社 2021-10-08 CN disclosed
CN-109071742-B Resin composition, cured film thereof, method for producing same, and solid-state imaging device 东丽株式会社 2021-07-09 CN disclosed
US-10988616-B2 Thermosetting resin composition, cured film, substrate with cured film, and electronic component JNC CORPORATION (JP) 2021-04-27 US disclosed
US-20080103280-A1 Ink-jet ink and cured film obtained from same CHISSO CORPORATION 2008-05-01 US disclosed
US-20080085361-A1 Inkjet ink CHISSO CORPORATION 2008-04-10 US disclosed
EP-1894977-A1 Inkjet ink Chisso Corporation (JP) 2008-03-05 EP disclosed
US-20080003381-A1 Overcoat film composition, color filter substrate, and liquid crystal display element CHISSO CORPORATION 2008-01-03 US disclosed
US-7230064-B2 Process for the preparation of urethane resins and urethane resin compositions KONISHI CO., LTD. (JP) 2007-06-12 US disclosed
US-7208560-B1 Process for the preparation of urethane resins and urethane resin compositions KONISHI CO., LTD. (JP) 2007-04-24 US disclosed
US-20060241249-A1 Curable resin composition and process for production thereof KANEKA CORPORATION (JP) 2006-10-26 US disclosed
US-20030092867-A1 Process for the preparation of urethane resins and urethane resin compositions SATO SHINICHI (JP) 2003-05-15 US disclosed
EP-0919582-A1 PROCESS FOR THE PREPARATION OF URETHANE RESINS AND URETHANE RESIN COMPOSITIONS KONISHI CO., LTD. (JP) 1999-06-02 EP disclosed
US-4972005-A Ultraviolet-curable composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 1990-11-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080085361-A1 Inkjet ink MAOA, MAOB, AADAT TSHR 4293/4885ALDH1A1 67/4885LMNA 3339/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.