SCHEMBL1306384

SCHEMBL1306384

C[Si](C)(C)C#Cc1ccc(C#C[Si](C)(C)C)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 4/20 0.38
GABRG2 P18507 4/20 0.38
GABRB3 P28472 4/20 0.38
GABRA5 P31644 4/20 0.38
GABRA3 P34903 4/20 0.38
GABRA2 P47869 4/20 0.38
APP P05067 3/20 0.36
GRM5 P41594 3/20 0.36
CYP1A2 P05177 3/20 0.33
CYP1A1 P04798 1/20 0.33
CYP1B1 Q16678 1/20 0.33
KDM4E B2RXH2 3/20 0.32
MEN1 O00255 3/20 0.32
ALDH1A1 P00352 3/20 0.32
HPGD P15428 3/20 0.32
CYP2C19 P33261 3/20 0.32
KMT2A Q03164 3/20 0.32
RAB9A P51151 3/20 0.32
SMN1; SMN2 Q16637 3/20 0.32
CYP3A4 P08684 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1306505 0.97 APP (0.41) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL2854252 0.92 CYP1A1 (0.44) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL19174201 0.89 CYP1A1 (0.48) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL440124 0.89 GRM5 (0.50) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL4736294 0.87 GABRA1 (0.37) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL613688 0.87 MAOA (0.39) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL3347257 0.87 GRM5 (0.48) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL1230904 0.87 GABRA1 (0.37) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL1230907 0.87 APP (0.48) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL853691 0.87 CYP2A6 (0.48) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114604852-B Preparation method of novel supercapacitor negative electrode material linear graphite alkyne 深圳市翔丰华科技股份有限公司 2023-12-12 CN claimed
CN-114604852-A Preparation method of novel linear graphite alkyne serving as supercapacitor negative electrode material 深圳市翔丰华科技股份有限公司 2022-06-10 CN claimed
US-20220056167-A1 Functionalized Cyclic Polymers and Methods of Preparing Same NATIONAL SCIENCE FOUNDATION 2022-02-24 US claimed
US-9481810-B2 Silylated polyarylenes ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2016-11-01 US claimed
US-12084554-B2 Polyphenylenes, methods, and uses thereof SIMON FRASER UNIVERSITY (CA) 2024-09-10 US disclosed
US-11970590-B2 Polyphenylenes, methods, and uses thereof SIMON FRASER UNIVERSITY 2024-04-30 US disclosed
US-20240117132-A1 POLYPHENYLENES, METHODS, AND USES THEREOF SIMON FRASER UNIVERSITY (CA) 2024-04-11 US disclosed
CN-114604852-B Preparation method of novel supercapacitor negative electrode material linear graphite alkyne 深圳市翔丰华科技股份有限公司 2023-12-12 CN disclosed
US-11814462-B2 Functionalized cyclic polymers and methods of preparing same UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) 2023-11-14 US disclosed
CN-117003917-A Phenylene Polymer, method and use thereof 西蒙弗雷泽大学 2023-11-07 CN disclosed
CN-117003969-A Phenylene Polymer, method and use thereof 西蒙弗雷泽大学 2023-11-07 CN disclosed
US-11802187-B2 Polyphenylenes, methods, and uses thereof SIMON FRASER UNIVERSITY (CA) 2023-10-31 US disclosed
US-20020161173-A1 Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film JSR CORPORATION (JP) 2002-10-31 US disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 US disclosed
EP-1245638-A1 Composition for insulating film formation JSR Corporation (JP) 2002-10-02 EP disclosed
US-20020064953-A1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORPORATION (JP) 2002-05-30 US disclosed
EP-1188807-A2 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR Corporation (JP) 2002-03-20 EP disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed
EP-0650970-A1 Bisketene derivatives and process for production and use thereof Tidwell, Thomas T. (CA) 1995-05-03 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240117132-A1 POLYPHENYLENES, METHODS, AND USES THEREOF PICALM, PARN, PHOSPHO1 GABRA1 2161/4885GABRG2 2359/4885GABRB3 3183/4885
US-11802187-B2 Polyphenylenes, methods, and uses thereof PICALM, PARN, PHOSPHO1 GABRA1 2484/4885GABRG2 2646/4885GABRB3 3408/4885
US-12084554-B2 Polyphenylenes, methods, and uses thereof PICALM, PARN, PHOSPHO1 GABRA1 2161/4885GABRG2 2359/4885GABRB3 3183/4885
US-11970590-B2 Polyphenylenes, methods, and uses thereof PICALM, PARN, PHOSPHO1 GABRA1 2161/4885GABRG2 2359/4885GABRB3 3183/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.