SCHEMBL13080641

SCHEMBL13080641

C=CC(=O)Oc1ccc(C(c2ccccc2)(c2ccccc2)S(=O)(=O)C(F)(F)COC(=O)C2CC3CCC2C3)cc1

nearest known ligand 0.34

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
MAPT P10636 1/20 0.31
KMT2A Q03164 1/20 0.31
EPHX2 P34913 1/20 0.31
ALDH1A1 P00352 1/20 0.30
TEAD1 P28347 1/20 0.30
SLC6A3 Q01959 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13080638 0.87 HPGD (0.38) HPGDL3MBTL1MAPTKMT2AALDH1A1
SCHEMBL3455540 0.82 HPGD (0.33) HPGDL3MBTL1MAPTKMT2AEPHX2
SCHEMBL4352150 0.71 HPGD (0.39) HPGDL3MBTL1MAPTKMT2AALDH1A1
SCHEMBL3454435 0.71 ELANE (0.35) HPGDL3MBTL1MAPTKMT2ASLC6A3
SCHEMBL13080656 0.71 ELANE (0.39) L3MBTL1MAPTKMT2AALDH1A1
SCHEMBL11962457 0.70 HPGD (0.31) HPGDL3MBTL1
SCHEMBL10134892 0.70 POLB (0.40) HPGDL3MBTL1MAPTEPHX2ALDH1A1
SCHEMBL13080639 0.69 EPHX2 (0.39) HPGDL3MBTL1MAPTEPHX2ALDH1A1
SCHEMBL3454543 0.69 POLB (0.39) HPGDL3MBTL1MAPTEPHX2ALDH1A1
SCHEMBL3455548 0.69 HPGD (0.36) HPGDL3MBTL1ALDH1A1SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8283102-B2 Photoacid generator, copolymer, chemically amplified resist composition, and method of forming pattern using the chemically amplified resist composition KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2012-10-09 US disclosed
US-20100143843-A1 PHOTOACID GENERATOR, COPOLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND METHOD OF FORMING PATTERN USING THE CHEMICALLY AMPLIFIED RESIST COMPOSITION KOREA KUMHO PETROCHEMICAL CO., LTD. 2010-06-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100143843-A1 PHOTOACID GENERATOR, COPOLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND METHOD OF FORMING PATTERN USING THE CHEMICALLY AMPLIFIED RESIST COMPOSITION POLL, PARG, POLH HPGD 3773/4885L3MBTL1 4613/4885MAPT 3300/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.