SCHEMBL3454543

SCHEMBL3454543

O=C(OCC(F)(F)S(=O)(=O)O)C1CC2CCC1C2.[NaH]

nearest known ligand 0.39

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.39
EPHX2 P34913 4/20 0.34
HSD11B1 P28845 1/20 0.33
HPGD P15428 2/20 0.32
L3MBTL1 Q9Y468 2/20 0.31
NPC1 O15118 1/20 0.30
ALDH1A1 P00352 1/20 0.30
MAPT P10636 1/20 0.30
MAPK1 P28482 1/20 0.30
RAB9A P51151 1/20 0.30
GFER P55789 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10134892 0.99 POLB (0.40) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL19036857 0.90 POLB (0.32) POLB
SCHEMBL12912754 0.90 POLB (0.35) POLBEPHX2HSD11B1
SCHEMBL13080639 0.86 EPHX2 (0.39) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL18400994 0.85 POLB (0.31) POLB
SCHEMBL4352150 0.84 HPGD (0.39) POLBHPGDL3MBTL1NPC1ALDH1A1
SCHEMBL14680960 0.84 POLB (0.37) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL18785326 0.83 POLB (0.39) POLBEPHX2HSD11B1HPGDL3MBTL1
SCHEMBL3455548 0.81 HPGD (0.36) HPGDL3MBTL1ALDH1A1
SCHEMBL21853767 0.79 POLB (0.47) POLBEPHX2HSD11B1HPGDL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8779183-B2 Acid generating agent for chemically amplified resist compositions KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2014-07-15 US disclosed
US-8283102-B2 Photoacid generator, copolymer, chemically amplified resist composition, and method of forming pattern using the chemically amplified resist composition KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2012-10-09 US disclosed
US-20100143843-A1 PHOTOACID GENERATOR, COPOLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND METHOD OF FORMING PATTERN USING THE CHEMICALLY AMPLIFIED RESIST COMPOSITION KOREA KUMHO PETROCHEMICAL CO., LTD. 2010-06-10 US disclosed
US-20090234155-A1 Acid generating agent for chemically amplified resist compositions KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2009-09-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100143843-A1 PHOTOACID GENERATOR, COPOLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND METHOD OF FORMING PATTERN USING THE CHEMICALLY AMPLIFIED RESIST COMPOSITION POLL, PARG, POLH POLB 6/4885EPHX2 2001/4885HSD11B1 4252/4885
US-20090234155-A1 Acid generating agent for chemically amplified resist compositions POLM, CBR1, PFAS POLB 48/4885EPHX2 177/4885HSD11B1 1367/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.