SCHEMBL13087151

SCHEMBL13087151

COc1ccc(/C=C/C(=O)N2CCCCC2)c(OC(=O)OC(C)(C)C)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.53
PTGS2 P35354 3/20 0.53
KDM4E B2RXH2 3/20 0.52
SMN1; SMN2 Q16637 2/20 0.52
LMNA P02545 2/20 0.52
GAA P10253 1/20 0.52
ALDH1A1 P00352 4/20 0.49
MAPT P10636 4/20 0.49
KMT2A Q03164 3/20 0.49
MEN1 O00255 2/20 0.49
TDP1 Q9NUW8 1/20 0.47
TRPV1 Q8NER1 1/20 0.47
BCHE P06276 1/20 0.44
MAOA P21397 1/20 0.44
ACHE P22303 1/20 0.44
MAOB P27338 1/20 0.44
PELI1 Q96FA3 1/20 0.43
TNFRSF1A P19438 1/20 0.43
NPC1 O15118 1/20 0.43
RAB9A P51151 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL765992 0.89 HPGD (0.46) HPGDPTGS2KDM4ESMN1; SMN2LMNA
SCHEMBL766006 0.87 PELI1 (0.56) HPGDPTGS2KDM4ESMN1; SMN2ALDH1A1
SCHEMBL766030 0.87 HPGD (0.49) HPGDPTGS2KDM4ESMN1; SMN2ALDH1A1
SCHEMBL10227977 0.86 HPGD (0.53) HPGDPTGS2KDM4ESMN1; SMN2ALDH1A1
SCHEMBL766028 0.83 HPGD (0.65) HPGDKDM4ESMN1; SMN2ALDH1A1MAPT
SCHEMBL13087409 0.83 HPGD (0.50) HPGDPTGS2KDM4ESMN1; SMN2ALDH1A1
SCHEMBL20109837 0.83 PELI1 (0.50) HPGDPTGS2KDM4ESMN1; SMN2ALDH1A1
SCHEMBL766044 0.82 HPGD (0.45) HPGDPTGS2KDM4ESMN1; SMN2ALDH1A1
SCHEMBL13087048 0.82 TRPV1 (0.47) HPGDPTGS2KDM4ESMN1; SMN2ALDH1A1
SCHEMBL766038 0.82 ALDH1A1 (0.47) HPGDPTGS2KDM4ESMN1; SMN2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2010113813-A1 BASE-GENERATING AGENT, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION 大日本印刷株式会社 (JP) 2010-10-07 WO disclosed