SCHEMBL766028

SCHEMBL766028

CC(C)(C)OC(=O)Oc1ccccc1/C=C/C(=O)N1CCCCC1

nearest known ligand 0.65

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.65
KDM4E B2RXH2 3/20 0.52
ALDH1A1 P00352 5/20 0.50
MAPT P10636 4/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
SMN1; SMN2 Q16637 3/20 0.47
KMT2A Q03164 3/20 0.47
NPC1 O15118 2/20 0.47
RAB9A P51151 2/20 0.47
MEN1 O00255 2/20 0.47
TRPV1 Q8NER1 1/20 0.43
BCHE P06276 1/20 0.42
MAOA P21397 1/20 0.42
ACHE P22303 1/20 0.42
MAOB P27338 1/20 0.42
PELI1 Q96FA3 2/20 0.42
TFEB P19484 1/20 0.42
NFE2L2 Q16236 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL766006 0.85 PELI1 (0.56) HPGDKDM4EALDH1A1MAPTL3MBTL1
SCHEMBL766030 0.85 HPGD (0.49) HPGDKDM4EALDH1A1MAPTL3MBTL1
SCHEMBL766038 0.84 ALDH1A1 (0.47) HPGDKDM4EALDH1A1MAPTL3MBTL1
SCHEMBL766018 0.84 HPGD (0.46) HPGDKDM4EALDH1A1MAPTSMN1; SMN2
SCHEMBL766007 0.84 HPGD (0.73) HPGDKDM4EALDH1A1MAPTL3MBTL1
SCHEMBL13087151 0.83 HPGD (0.53) HPGDKDM4EALDH1A1MAPTSMN1; SMN2
SCHEMBL766044 0.82 HPGD (0.45) HPGDKDM4EALDH1A1MAPTL3MBTL1
SCHEMBL13087048 0.82 TRPV1 (0.47) HPGDKDM4EALDH1A1MAPTL3MBTL1
SCHEMBL767868 0.82 HPGD (0.64) HPGDKDM4EALDH1A1MAPTL3MBTL1
SCHEMBL10227977 0.81 HPGD (0.53) HPGDKDM4EALDH1A1MAPTL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME DAI NIPPON PRINTING CO., LTD. (JP) 2012-03-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME RER1, SUN2, REV1 HPGD 861/4885KDM4E 2434/4885ALDH1A1 2053/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.