⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13179959 | 0.82 | CA2 (0.35) | — | |
| SCHEMBL13098311 | 0.80 | — | — | |
| SCHEMBL3853587 | 0.79 | KDM4E (0.30) | — | |
| SCHEMBL13098333 | 0.77 | KMT2A (0.47) | — | |
| SCHEMBL13098317 | 0.75 | — | — | |
| SCHEMBL13098336 | 0.73 | PTGS2 (0.35) | — | |
| SCHEMBL13098318 | 0.70 | KDM4E (0.42) | — | |
| SCHEMBL13098332 | 0.70 | ALDH1A1 (0.37) | — | |
| SCHEMBL13098326 | 0.67 | ATM (0.33) | — | |
| SCHEMBL12039815 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7812194-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-20100255419-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-7776512-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-08-17 | — | — | US | disclosed |
| US-20090148791-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7435526-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-10-14 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |