SCHEMBL3853587

SCHEMBL3853587

O=C1C2=C(CCCC2)C(=O)N1OS(=O)(=O)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.30
LMNA P02545 1/20 0.30
PARL Q9H300 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13179959 0.82 CA2 (0.35)
SCHEMBL13098321 0.79
SCHEMBL16883338 0.77 PARL (0.43) LMNAPARL
SCHEMBL64814 0.76 PARL (0.50) PARL
SCHEMBL3087267 0.76 PARL (0.50) PARL
SCHEMBL2382893 0.75 VDR (0.33) KDM4ELMNA
SCHEMBL64157 0.70 ALDH1A1 (0.61) KDM4ELMNA
SCHEMBL29368754 0.70 ALDH1A1 (0.61) KDM4ELMNA
SCHEMBL5929449 0.70 PTGS2 (0.33)
SCHEMBL3855033 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7582412-B2 Undercoating; photoresists; overcoatings; impact strength; etching resistance; antireflectivity; forming relief images ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2009-09-01 US disclosed
US-7390608-B2 Photoresists containing Si-polymers ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-06-24 US disclosed
US-7306892-B2 Multilayer photoresist system SHIPLEY COMPANY, L.L.C. (US) 2007-12-11 US disclosed
EP-1319197-B1 ANTIREFLECTIVE COMPOSITION SHIPLEY CO LLC (US) 2007-06-06 EP disclosed
US-7217490-B2 Processes for producing silane monomers and polymers and photoresist compositions comprising same SHIPLEY COMPANY, L.L.C. (US) 2007-05-15 US disclosed
US-7118847-B2 Polymer and photoresist compositions SHIPLEY COMPANY LLC (US) 2006-10-10 US disclosed
US-7008750-B2 Processes for producing polysiloxanes and photoresist compositions comprising same SHIPLEY COMPANY, L.L.C. (US) 2006-03-07 US disclosed
US-20050170278-A1 Polymer and photoresist compositions SZMANDA CHARLES R (US) 2005-08-04 US disclosed
EP-1127900-B1 Polymer and photoresist compositions SHIPLEY CO LLC (US) 2005-04-27 EP disclosed
US-6855475-B2 Photoresist composition SHIPLEY COMPANY, L.L.C. (US) 2005-02-15 US disclosed
WO-2002077712-A2 PHOTORESIST COMPOSITION SHIPLEY COMPANY, L.L.C. (US) 2002-10-03 WO disclosed
US-20020119391-A1 Polymer and photoresist compositions SHIPLEY COMPANY, L.L.C. (US) 2002-08-29 US disclosed
US-20020076642-A1 Antireflective composition SHIPLEY COMPANY, L.L.C. 2002-06-20 US disclosed
US-6406828-B1 Polymer and photoresist compositions SHIPLEY COMPANY, L.L.C. 2002-06-18 US disclosed
US-20020051928-A1 Photoresist composition SHIPLEY COMPANY, L.L.C. (US) 2002-05-02 US disclosed
WO-2002023274-A2 PHOTORESIST COMPOSITION SHIPLEY COMPANY, L.L.C. (US) 2002-03-21 WO disclosed
US-20020004570-A1 Polymer and photoresist compositions SHIPLEY COMPANY, L.L.C. (US) 2002-01-10 US disclosed
EP-1130468-A2 Polymer and photoresist compositions Shipley Company LLC (US) 2001-09-05 EP disclosed
EP-1127900-A1 Polymer and photoresist compositions Shipley Company LLC (US) 2001-08-29 EP disclosed
EP-1127899-A1 Polymer and photoresist compositions Shipley Company LLC (US) 2001-08-29 EP disclosed