SCHEMBL1312263

SCHEMBL1312263

C=C[Si](C=C)(OC(C)=O)OC(C)=O

nearest known ligand 0.38

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.38
HSD17B10 Q99714 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6564138 0.78 ALDH1A1 (0.38) ALDH1A1HSD17B10TDP1TSHR
SCHEMBL49611 0.78 ALDH1A1 (0.38) ALDH1A1HSD17B10TDP1TSHR
SCHEMBL8636707 0.78 ALDH1A1 (0.38) ALDH1A1HSD17B10TDP1TSHR
SCHEMBL123171 0.76
Water SCHEMBL28119346 0.76 ALDH1A1 (0.36) ALDH1A1HSD17B10TDP1TSHR
SCHEMBL5613567 0.76 ALDH1A1 (0.36) ALDH1A1HSD17B10TDP1TSHR
SCHEMBL71977 0.76 ALDH1A1 (0.36) ALDH1A1HSD17B10TDP1TSHR
SCHEMBL9722121 0.74
SCHEMBL2950749 0.74 ALDH1A1 (0.35) ALDH1A1HSD17B10TDP1TSHR
SCHEMBL6564179 0.74 ALDH1A1 (0.35) ALDH1A1HSD17B10TDP1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 192 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0477765-A2 Thermoplastic, coupled barrier composites THE B.F. GOODRICH COMPANY (US) 1992-04-01 EP claimed
US-20260130142-A1 Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface Features VERSUM MAT US LLC (US) 2026-05-07 US disclosed
US-20260118764-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2026-04-30 US disclosed
EP-4715465-A1 MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER Nissan Chemical Corporation (JP) 2026-03-25 EP disclosed
US-12585188-B2 Composition for forming resist underlying film NISSAN CHEMICAL CORPORATION (JP) 2026-03-24 US disclosed
CN-121586750-A Composition for forming silicon-containing underlayer film for directional self-assembly 日产化学株式会社 2026-02-27 CN disclosed
EP-4679175-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM Nissan Chemical Corporation (JP) 2026-01-14 EP disclosed
US-12505999-B2 Precursors and flowable CVD methods for making low-K films to fill surface features VERSUM MATERIALS US, LLC (US) 2025-12-23 US disclosed
US-20250377596-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2025-12-11 US disclosed
US-20250362609-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID NISSAN CHEMICAL CORPORATION (JP) 2025-11-27 US disclosed
US-4720534-A NCO-terminated compounds from adducts of mercapto-functional polyhydric alcohols and vinyl-type silanes containing hydrolyzable groups PPG INDUSTRIES, INC. (US) 1988-01-19 US disclosed
EP-0231514-A2 Compositions based on resins having silicon atoms attached to hydrolyzable groups derived from vinyl silanes and mercaptofunctional compounds PPG INDUSTRIES, INC. (US) 1987-08-12 EP disclosed
EP-0229390-A2 Reaction products of mercapto-functional monohydric alcohols and vinyl silanes, and NCO-functional compounds therefrom PPG INDUSTRIES, INC. (US) 1987-07-22 EP disclosed
US-4652610-A FLEXIBLE COATINGS; AUTOMOBILE PAINTS PPG INDUSTRIES, INC. (US) 1987-03-24 US disclosed
US-4652664-A Addition products prepared from mercapto-functional polyhydric alcohols and vinyl-type silanes containing hydrolyzable groups PPG INDUSTRIES, INC. (US) 1987-03-24 US disclosed
US-4332879-A Process for depositing a film of controlled composition using a metallo-organic photoresist HUGHES AIRCRAFT COMPANY (US) 1982-06-01 US disclosed
US-4273896-A Silylated polymers and silylated organic-organopolysiloxane block copolymers SWS SILICONES CORPORATION (US) 1981-06-16 US disclosed
US-4148838-A Silylated block copolymers SWS SILICONES CORPORATION (US) 1979-04-10 US disclosed
US-4143089-A SILYLATED POLYMERS SWS SILICONES CORPORATION (US) 1979-03-06 US disclosed
US-4080400-A Silylated polymers and silylated organic-organopolysiloxane block copolymers SWS SILICONES CORPORATION (US) 1978-03-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260118764-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM SRSF1, MACF1, SRPK1 ALDH1A1 3642/4885HSD17B10 3753/4885TDP1 2376/4885
US-20260130142-A1 Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface Features VCAM1, LDLR, KDR ALDH1A1 3091/4885HSD17B10 279/4885TDP1 3216/4885
US-12505999-B2 Precursors and flowable CVD methods for making low-K films to fill surface features KDR, VCL, SIK1 ALDH1A1 3659/4885HSD17B10 417/4885TDP1 3027/4885
US-12585188-B2 Composition for forming resist underlying film SRR, SMC1A, ASH2L ALDH1A1 1320/4885HSD17B10 953/4885TDP1 3751/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.