SCHEMBL1320591

SCHEMBL1320591

C=Cc1ccc(C(=O)OC(C(F)(F)F)C(F)(F)S(=O)(=O)OS(c2ccccc2)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.32

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MCL1 Q07820 2/20 0.32
RAB9A P51151 1/20 0.32
HSD17B2 P37059 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
PDCD1 Q15116 1/20 0.31
CD274 Q9NZQ7 1/20 0.31
TP53 P04637 1/20 0.31
TSHR P16473 1/20 0.31
KMT2A Q03164 1/20 0.31
ESR1 P03372 1/20 0.30
ESR2 Q92731 1/20 0.30
LMNA P02545 1/20 0.30
MAPT P10636 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30
HSD11B1 P28845 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL246107 0.89 TSHR (0.40) RAB9APDCD1CD274TP53TSHR
SCHEMBL1671640 0.86 PDCD1 (0.45) MCL1PDCD1CD274TP53TSHR
SCHEMBL15209578 0.83 GAA (0.37) RAB9ATP53TSHRKMT2ALMNA
SCHEMBL15209939 0.83 ALDH1A1 (0.40) RAB9ATSHRKMT2AMAPTHSD11B1
SCHEMBL2580598 0.82 THRB (0.33) HSD11B1
SCHEMBL963504 0.81 GABRB1 (0.43) RAB9ATDP1KMT2ALMNAMAPT
SCHEMBL2886501 0.81 TDP1 (0.39) TDP1
SCHEMBL16820466 0.80
SCHEMBL962176 0.80 MAPT (0.42) RAB9ATDP1TP53TSHRKMT2A
SCHEMBL1673160 0.79 KMT2A (0.35) RAB9ATDP1TP53TSHRKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8057985-B2 Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-11-15 US disclosed
US-20100055608-A1 POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100055608-A1 POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS ARSA, ACSL3, RAD54L MCL1 3987/4885RAB9A 1852/4885HSD17B2 3807/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.