Known targets — ChEMBL curated mechanism
CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EP300 | Q09472 | 2/20 | 0.51 |
| ▸ | KAT2B | Q92831 | 2/20 | 0.51 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.51 |
| ▸ | MEN1 | O00255 | 5/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.48 |
| ▸ | GAA | P10253 | 3/20 | 0.48 |
| ▸ | ESR1 | P03372 | 1/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.48 |
| ▸ | HKDC1 | Q2TB90 | 1/20 | 0.44 |
| ▸ | COMT | P21964 | 1/20 | 0.42 |
| ▸ | LDHA | P00338 | 1/20 | 0.41 |
| ▸ | MAP1LC3B | Q9GZQ8 | 1/20 | 0.41 |
| ▸ | PKM | P14618 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | PSD | A5PKW4 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | RRM1 | P23921 | 1/20 | 0.39 |
| ▸ | G6PD | P11413 | 1/20 | 0.39 |
| ▸ | S100A4 | P26447 | 1/20 | 0.38 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3759525 | 0.85 | KMT2A (0.39) | EP300KAT2BKAT8MEN1KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL31168271 | 0.79 | LDHA (0.44) | EP300KAT2BKAT8MEN1KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL36124 | 0.79 | LDHA (0.44) | EP300KAT2BKAT8MEN1KMT2A | |
| SCHEMBL29420748 | 0.79 | IDO1 (0.59) | EP300KAT2BKAT8LDHATDP1 | |
| SCHEMBL132348 | 0.79 | IDO1 (0.59) | EP300KAT2BKAT8LDHATDP1 | |
| SCHEMBL3812585 | 0.78 | HCRTR1 (0.47) | MEN1KMT2AGAAESR1ESR2 | |
| Hydrochloric Acid SCHEMBL4410534 | 0.78 | IDO1 (0.56) | EP300KAT2BKAT8LDHATDP1 | |
| SCHEMBL562392 | 0.75 | GAA (0.41) | MEN1KMT2AGAATDP1L3MBTL1 | |
| SCHEMBL3871600 | 0.74 | KMT2A (0.58) | MEN1KMT2AGAAESR1ESR2 | |
| SCHEMBL1130786 | 0.74 | IDO1 (0.43) | EP300KAT2BKAT8MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1323742-B1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORP (JP) | 2011-02-16 | — | — | EP | disclosed |
| US-7842441-B2 | Norbornene polymer for photoresist and photoresist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-11-30 | — | — | US | disclosed |
| US-20090221845-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-09-03 | — | — | US | disclosed |
| US-7550545-B2 | Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-06-23 | — | — | US | disclosed |
| US-20090075207-A1 | NORBORNENE POLYMER FOR PHOTORESIST AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-03-19 | — | — | US | disclosed |
| US-7498393-B2 | Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-03-03 | — | — | US | disclosed |
| US-20080145783-A1 | Photosensitive Resin Composition and Organic Insulating Film Produced Using the Same | CHEIL INDUSTRIES INC. (KR) | 2008-06-19 | — | — | US | disclosed |
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| EP-1365290-B1 | RESIST COMPOSITION | ASAHI GLASS CO LTD (JP) | 2007-11-21 | — | — | EP | disclosed |
| US-20070207409-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-09-06 | — | — | US | disclosed |
| EP-1375597-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND UTILIZATION THEREOF | JSR Corporation (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1369459-A1 | RADIATION-SENSITIVE COMPOSITION CAPABLE OF HAVING REFRACTIVE INDEX DISTRIBUTION | JSR Corporation (JP) | 2003-12-10 | — | — | EP | disclosed |
| EP-1365290-A1 | RESIST COMPOSITION | ASAHI GLASS COMPANY LTD. (JP) | 2003-11-26 | — | — | EP | disclosed |
| EP-1350814-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX | JSR Corporation (JP) | 2003-10-08 | — | — | EP | disclosed |
| US-20030187119-A1 | Radiation-sensitive composition capable of having refractive index distribution | JSR CORPORATION (JP) | 2003-10-02 | — | — | US | disclosed |
| US-20030171468-A1 | Radiation-sensitive composition changing in refractive index and utilization thereof | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
| EP-1343047-A2 | Resist composition | ASAHI GLASS COMPANY LTD. (JP) | 2003-09-10 | — | — | EP | disclosed |
| US-20030139486-A1 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR CORPORATION (JP) | 2003-07-24 | — | — | US | disclosed |
| EP-1323742-A2 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR Corporation (JP) | 2003-07-02 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090221845-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | AFF4, AFF1, Q6ZSR9 | EP300 2032/4885KAT2B 1280/4885KAT8 1369/4885 |
| US-20070207409-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | AFF4, AFF1, Q6ZSR9 | EP300 2032/4885KAT2B 1280/4885KAT8 1369/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.