SCHEMBL13296170

SCHEMBL13296170

CCC(C)(C)C(=O)Nc1ccc(Br)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.54
KMT2A Q03164 4/20 0.54
RAB9A P51151 3/20 0.54
NPC1 O15118 2/20 0.54
TDP1 Q9NUW8 1/20 0.53
L3MBTL1 Q9Y468 1/20 0.52
FPR2 P25090 1/20 0.50
SMN1; SMN2 Q16637 3/20 0.49
LMNA P02545 2/20 0.49
POLB P06746 1/20 0.49
HPGD P15428 2/20 0.49
HTT P42858 2/20 0.47
RIPK1 Q13546 1/20 0.46
TSHR P16473 1/20 0.46
NFKB1 P19838 1/20 0.46
NFKB2 Q00653 1/20 0.46
RELA Q04206 1/20 0.46
GAA P10253 1/20 0.46
ALDH1A1 P00352 1/20 0.46
MAPT P10636 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12226380 0.91 L3MBTL1 (0.61) MEN1KMT2ATDP1L3MBTL1LMNA
SCHEMBL1104161 0.86 LMNA (0.59) MEN1KMT2ATDP1L3MBTL1LMNA
SCHEMBL12226381 0.85 L3MBTL1 (0.73) MEN1KMT2ARAB9ANPC1TDP1
SCHEMBL97686 0.84 MEN1 (0.54) MEN1KMT2ARAB9ANPC1TDP1
SCHEMBL13934889 0.84 POLB (0.55) MEN1KMT2ARAB9ANPC1TDP1
SCHEMBL10075598 0.82 MEN1 (0.53) MEN1KMT2ATDP1L3MBTL1LMNA
SCHEMBL19621272 0.82 MEN1 (0.53) MEN1KMT2ARAB9ANPC1TDP1
SCHEMBL26361794 0.82 HTT (0.61) MEN1KMT2ARAB9ANPC1TDP1
SCHEMBL13706549 0.82 MEN1 (0.53) MEN1KMT2ATDP1L3MBTL1LMNA
SCHEMBL16256509 0.82 MEN1 (0.53) MEN1KMT2ARAB9ANPC1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7736822-B2 Resist underlayer coating forming composition for mask blank, mask blank and mask HOYA CORPORATION (JP) 2010-06-15 US disclosed
US-20100081081-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION FOR ELECTRON BEAM LITHOGRAPHY NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-04-01 US disclosed
US-7309560-B2 Composition for forming anti-reflective coating NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-12-18 US disclosed
US-20070190459-A1 Resist underlayer coating forming composition for mask blank, mask blank and mask HOYA CORPORATION (JP) 2007-08-16 US disclosed