Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.53 |
| ▸ | MAPT | P10636 | 6/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.52 |
| ▸ | BRD4 | O60885 | 2/20 | 0.52 |
| ▸ | CYP1A1 | P04798 | 2/20 | 0.52 |
| ▸ | CA12 | O43570 | 1/20 | 0.52 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.52 |
| ▸ | CA1 | P00915 | 1/20 | 0.52 |
| ▸ | CA2 | P00918 | 1/20 | 0.52 |
| ▸ | MB | P02144 | 1/20 | 0.52 |
| ▸ | CA3 | P07451 | 1/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.52 |
| ▸ | RARG | P13631 | 1/20 | 0.52 |
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | ALOX5AP | P20292 | 1/20 | 0.52 |
| ▸ | CA4 | P22748 | 1/20 | 0.52 |
| ▸ | CA7 | P43166 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12226380 | 0.92 | L3MBTL1 (0.61) | MEN1KMT2ATDP1L3MBTL1MAPT | |
| SCHEMBL12226381 | 0.87 | L3MBTL1 (0.73) | MEN1KMT2ATDP1L3MBTL1MAPT | |
| SCHEMBL2742149 | 0.86 | MAPT (0.54) | MEN1KMT2ATDP1L3MBTL1MAPT | |
| SCHEMBL13934889 | 0.85 | POLB (0.55) | MEN1KMT2ATDP1L3MBTL1BRD4 | |
| SCHEMBL12441718 | 0.84 | BRD4 (0.47) | MEN1KMT2ATDP1L3MBTL1MAPT | |
| SCHEMBL13296170 | 0.84 | MEN1 (0.54) | MEN1KMT2ATDP1L3MBTL1MAPT | |
| SCHEMBL13706549 | 0.84 | MEN1 (0.53) | MEN1KMT2ATDP1L3MBTL1MAPT | |
| SCHEMBL1104161 | 0.84 | LMNA (0.59) | MEN1KMT2ATDP1L3MBTL1MAPT | |
| SCHEMBL10075598 | 0.84 | MEN1 (0.53) | MEN1KMT2ATDP1L3MBTL1MAPT | |
| SCHEMBL19621272 | 0.84 | MEN1 (0.53) | MEN1KMT2ATDP1L3MBTL1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230367214-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230341775-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-26 | — | — | US | disclosed |
| US-11773059-B2 | Onium salt, chemically amplified negative resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230288623-A1 | OPTICAL FILM, OPTICAL LAMINATE, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2023-09-14 | — | — | US | disclosed |
| US-11754926-B2 | Method of forming resist pattern, resist composition and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-20230265346-A1 | LIQUID CRYSTAL COMPOSITION, OPTICALLY ANISOTROPIC LAYER, LAMINATE, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2023-08-24 | — | — | US | disclosed |
| US-20230244143-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | JSR CORPORATION (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20080160445-A1 | Planographic printing plate material, and method of preparing planographic printing plate employing the same | KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) | 2008-07-03 | — | — | US | disclosed |
| US-20080138744-A1 | Anti-Reflective Coating Forming Composition Containing Vinyl Ether Compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-06-12 | — | — | US | disclosed |
| US-20080131812-A1 | Resin for printing plate material and lithographic printing plate material by use thereof | KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) | 2008-06-05 | — | — | US | disclosed |
| US-7338748-B2 | Polymerizable composition and planographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2008-03-04 | — | — | US | disclosed |
| US-7309560-B2 | Composition for forming anti-reflective coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-12-18 | — | — | US | disclosed |
| US-7279539-B2 | Alkali-soluble polymer and polymerizable composition thereof | FUJIFILM CORPORATION (JP) | 2007-10-09 | — | — | US | disclosed |
| US-20070202439-A1 | Polymerizable composition and planographic printing plate precursor | FUJIFILM CORPORATION | 2007-08-30 | — | — | US | disclosed |
| US-20070190459-A1 | Resist underlayer coating forming composition for mask blank, mask blank and mask | HOYA CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |
| US-7163777-B2 | Thermally imagable article comprising substrate coated with positive working heat-sensitive, hydroxyl group-containing polymer and a heat-labile moiety which decreases developer solubility; free of acid generators | EASTMAN KODAK COMPANY (US) | 2007-01-16 | — | — | US | disclosed |
| US-7163777-B2 | Thermally imagable article comprising substrate coated with positive working heat-sensitive, hydroxyl group-containing polymer and a heat-labile moiety which decreases developer solubility; free of acid generators | EASTMAN KODAK COMPANY (US) | 2007-01-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11773059-B2 | Onium salt, chemically amplified negative resist composition, and pattern forming process | LBR, IDUA, ADORA1 | MEN1 909/4885KMT2A 3089/4885TDP1 2855/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.