SCHEMBL13324968

SCHEMBL13324968

CCC(C)C(=O)OC1C2CC3C1OC(=O)C3C2C(=O)OCOC

nearest known ligand 0.31

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 6/20 0.31
CYP3A4 P08684 6/20 0.31
LMNA P02545 5/20 0.31
HIF1A Q16665 4/20 0.31
TSHR P16473 4/20 0.31
SMN1; SMN2 Q16637 4/20 0.31
ABCB11 O95342 3/20 0.31
KDM4E B2RXH2 2/20 0.31
ITGB2 P05107 2/20 0.31
ICAM1 P05362 2/20 0.31
PGR P06401 2/20 0.31
ABCB1 P08183 2/20 0.31
ADORA3 P0DMS8 2/20 0.31
MAPT P10636 2/20 0.31
ADRB3 P13945 2/20 0.31
ALOX15 P16050 2/20 0.31
ITGAL P20701 2/20 0.31
TACR2 P21452 2/20 0.31
TBXA2R P21731 2/20 0.31
SLC6A2 P23975 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL824265 0.91 ALDH1A1 (0.33) HMGCRCYP3A4LMNAHIF1ATSHR
SCHEMBL6367919 0.90 KMT2A (0.33) HMGCRCYP3A4LMNAHIF1ATSHR
SCHEMBL17853803 0.89 HMGCR (0.30) HMGCRCYP3A4LMNAHIF1ATSHR
SCHEMBL25455487 0.86 KMT2A (0.32) MEN1KMT2AALDH1A1HTT
SCHEMBL25514459 0.85 OPRK1 (0.34) MEN1KMT2AALDH1A1HTT
SCHEMBL17853802 0.85 HMGCR (0.33) HMGCRCYP3A4LMNAHIF1ATSHR
SCHEMBL12405799 0.85 HMGCR (0.33) HMGCRCYP3A4LMNAHIF1ATSHR
SCHEMBL12018699 0.85 FABP7 (0.32) HMGCRCYP3A4LMNAHIF1ATSHR
SCHEMBL6367915 0.85 HMGCR (0.33) HMGCRCYP3A4LMNAHIF1ATSHR
SCHEMBL12533392 0.84 HMGCR (0.33) HMGCRCYP3A4LMNAHIF1ATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7718342-B2 Polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-05-18 US disclosed
US-20070148594-A1 Polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2007-06-28 US disclosed