SCHEMBL25514459

SCHEMBL25514459

COCOC(=O)C1C2CC3C(OC(=O)C31)C2OC(C)=O

nearest known ligand 0.34

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
OPRK1 P41145 2/20 0.34
KMT2A Q03164 4/20 0.33
MEN1 O00255 1/20 0.33
ALDH1A1 P00352 1/20 0.32
GLA P06280 1/20 0.32
HPGD P15428 1/20 0.32
HTT P42858 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13923285 0.89 MEN1 (0.32) KMT2AMEN1HTT
SCHEMBL25455487 0.88 KMT2A (0.32) KMT2AMEN1ALDH1A1GLAHPGD
SCHEMBL14602112 0.88 KMT2A (0.35) OPRK1KMT2AMEN1ALDH1A1
SCHEMBL13648552 0.87 OPRK1 (0.34) OPRK1KMT2AMEN1ALDH1A1GLA
SCHEMBL14219797 0.87 OPRK1 (0.34) OPRK1KMT2AMEN1ALDH1A1GLA
SCHEMBL24861755 0.87 OPRK1 (0.34) OPRK1KMT2AMEN1ALDH1A1GLA
SCHEMBL12920497 0.85 MEN1 (0.31) KMT2AMEN1
SCHEMBL13324968 0.85 HMGCR (0.31) KMT2AMEN1ALDH1A1HTT
SCHEMBL13324964 0.85 HMGCR (0.35) OPRK1KMT2AMEN1ALDH1A1
SCHEMBL26230543 0.84 ALDH1A1 (0.31) KMT2AMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 US disclosed
US-20230305392-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-28 US disclosed
US-20230161243-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-25 US disclosed
US-20230139896-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230161243-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, ASIC1, REN OPRK1 3825/4885KMT2A 1882/4885MEN1 1918/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.