Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 1/20 | 0.37 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | DPP4 | P27487 | 3/20 | 0.33 |
| ▸ | DPP8 | Q6V1X1 | 1/20 | 0.32 |
| ▸ | DPP9 | Q86TI2 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | MDH1 | P40925 | 1/20 | 0.31 |
| ▸ | MDH2 | P40926 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15281467 | 1.00 | PKM (0.37) | PKMHSD11B1ALDH1A1DPP4DPP8 | |
| SCHEMBL41045 | 1.00 | PKM (0.37) | PKMHSD11B1ALDH1A1DPP4DPP8 | |
| Methacrylic Acid SCHEMBL5355469 | 0.95 | PKM (0.34) | PKMHSD11B1ALDH1A1DPP4DPP8 | |
| SCHEMBL13649563 | 0.94 | PKM (0.33) | PKMHSD11B1ALDH1A1DPP4DPP8 | |
| Acrylic Acid SCHEMBL28227378 | 0.92 | PKM (0.32) | PKMHSD11B1DPP8DPP9 | |
| SCHEMBL737596 | 0.90 | ALDH1A1 (0.35) | ALDH1A1DPP4NPSR1 | |
| SCHEMBL21235121 | 0.90 | DPP4 (0.30) | DPP4 | |
| SCHEMBL29082660 | 0.89 | HSD11B1 (0.33) | PKMHSD11B1DPP4 | |
| SCHEMBL5856204 | 0.89 | CYP17A1 (0.32) | PKMHSD11B1 | |
| SCHEMBL19050241 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2426154-B1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJIFILM CORP (JP) | 2013-01-09 | — | — | EP | disclosed |
| EP-2177506-A1 | POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND USED IN THE COMPOSITION | Fujifilm Corporation (JP) | 2010-04-21 | — | — | EP | disclosed |
| EP-1641848-B1 | PHOTORESIST POLYMER COMPOSITIONS | JSR CORP (JP) | 2007-08-22 | — | — | EP | disclosed |