Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 1/20 | 0.37 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | DPP4 | P27487 | 3/20 | 0.33 |
| ▸ | DPP8 | Q6V1X1 | 1/20 | 0.32 |
| ▸ | DPP9 | Q86TI2 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | MDH1 | P40925 | 1/20 | 0.31 |
| ▸ | MDH2 | P40926 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15281467 | 1.00 | PKM (0.37) | PKMHSD11B1ALDH1A1DPP4DPP8 | |
| SCHEMBL13383446 | 1.00 | PKM (0.37) | PKMHSD11B1ALDH1A1DPP4DPP8 | |
| Methacrylic Acid SCHEMBL5355469 | 0.95 | PKM (0.34) | PKMHSD11B1ALDH1A1DPP4DPP8 | |
| SCHEMBL13649563 | 0.94 | PKM (0.33) | PKMHSD11B1ALDH1A1DPP4DPP8 | |
| Acrylic Acid SCHEMBL28227378 | 0.92 | PKM (0.32) | PKMHSD11B1DPP8DPP9 | |
| SCHEMBL737596 | 0.90 | ALDH1A1 (0.35) | ALDH1A1DPP4NPSR1 | |
| SCHEMBL21235121 | 0.90 | DPP4 (0.30) | DPP4 | |
| SCHEMBL29082660 | 0.89 | HSD11B1 (0.33) | PKMHSD11B1DPP4 | |
| SCHEMBL5856204 | 0.89 | CYP17A1 (0.32) | PKMHSD11B1 | |
| SCHEMBL19050241 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4617 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119463004-B | 3, 4-Dihydroxystyrene polymer, preparation thereof and photoresist composition | 微芯新材料(湖州)有限公司 | 2025-06-10 | — | — | CN | claimed |
| CN-120025480-A | Modified styrene-acrylic emulsion, interior wall coating and preparation method thereof | 立邦涂料（中国）有限公司 | 2025-05-23 | — | — | CN | claimed |
| CN-120005123-A | Acrylic ester block copolymer resin, photoresist, and preparation method and application thereof | 中国石油化工股份有限公司 | 2025-05-16 | — | — | CN | claimed |
| CN-119859481-A | New energy automobile tire self-repairing sealing material adhered with mute cotton | 山东万达宝通轮胎有限公司 | 2025-04-22 | — | — | CN | claimed |
| CN-119798551-A | Long-activation-period hydroxypropyl emulsion for plate-splicing glue and preparation method and application thereof | 山东盛驰新材料有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-119613607-A | Preparation method of 193nm photoresist resin | 江苏集萃光敏电子材料研究所有限公司 | 2025-03-14 | — | — | CN | claimed |
| CN-119286336-B | Laser transfer coating and preparation method thereof | 广州慧谷新材料科技股份有限公司 | 2025-03-11 | — | — | CN | claimed |
| CN-115542665-B | Positive chemical amplification type photoresist and application method thereof | 徐州博康信息化学品有限公司 | 2025-03-07 | — | — | CN | claimed |
| CN-119556527-A | Photoresist composition and preparation process thereof | 广东科优材料科技有限公司 | 2025-03-04 | — | — | CN | claimed |
| CN-119463402-A | High-temperature-resistant flame-retardant thermoplastic elastomer and preparation method thereof | 厦门港沅塑胶工业有限公司 | 2025-02-18 | — | — | CN | claimed |
| US-20030129531-A1 | Positive-working photoimageable bottom antireflective coating | MERCK PATENT GMBH (DE) | 2003-07-10 | — | — | US | claimed |
| US-20030114589-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-06-19 | — | — | US | claimed |
| US-6548220-B2 | Containing acid generator | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-04-15 | — | — | US | claimed |
| CN-1407405-A | Chemical enlarging positive corrosion resist composition | SUMITOMO CHEMICAL CO (JP) | 2003-04-02 | — | — | CN | claimed |
| US-20020197555-A1 | Process for producing film forming resins for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-26 | — | — | US | claimed |
| WO-2002084402-A2 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-10-24 | — | — | WO | claimed |
| US-20020015913-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-07 | — | — | US | claimed |
| CN-1330289-A | Optical enhancement right photoetching rubber composite and sulfonium salt | SUMITOMO CHEMICAL CO (JP) | 2002-01-09 | — | — | CN | claimed |
| EP-1167349-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-02 | — | — | EP | claimed |
| CN-1322968-A | Chemical reinforcing photoresist structure composition and sulfonium salt | SUMITOMO CHEMICAL CO (JP) | 2001-11-21 | — | — | CN | claimed |