SCHEMBL13430242

SCHEMBL13430242

CCC(C)C(=O)OCC1C2CC3CC1CC(C2)C3O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13430240 0.85 HSD11B1 (0.30) —
SCHEMBL13430245 0.78 HMGCR (0.32) —
SCHEMBL13334544 0.73 HSD11B1 (0.36) —
SCHEMBL13430226 0.72 HMGCR (0.39) —
SCHEMBL19766286 0.72 SCN9A (0.32) —
SCHEMBL10120459 0.71 EPHX2 (0.36) —
SCHEMBL16480370 0.69 SHBG (0.38) —
SCHEMBL12587866 0.69 LMNA (0.44) —
SCHEMBL2055318 0.68 ALDH1A1 (0.50) —
SCHEMBL9924484 0.68 ALDH1A1 (0.46) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100062374-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-11 — — US disclosed
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