SCHEMBL13497451

SCHEMBL13497451

CCc1c2ccccc2c(COC)c2ccccc12

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 7/20 0.37
▸ KDM4E B2RXH2 7/20 0.37
▸ SMN1; SMN2 Q16637 2/20 0.37
▸ MAPK1 P28482 1/20 0.37
▸ HTT P42858 4/20 0.35
▸ GABRP O00591 1/20 0.35
▸ GABRD O14764 1/20 0.35
▸ GABRA1 P14867 1/20 0.35
▸ GABRB1 P18505 1/20 0.35
▸ GABRG2 P18507 1/20 0.35
▸ GABRB3 P28472 1/20 0.35
▸ GABRA5 P31644 1/20 0.35
▸ GABRA3 P34903 1/20 0.35
▸ GABRA2 P47869 1/20 0.35
▸ GABRB2 P47870 1/20 0.35
▸ GABRA4 P48169 1/20 0.35
▸ GABRE P78334 1/20 0.35
▸ GABRA6 Q16445 1/20 0.35
▸ GABRG1 Q8N1C3 1/20 0.35
▸ GABRG3 Q99928 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1334758 0.91 ALDH1A1 (0.43) ALDH1A1KDM4ESMN1; SMN2MAPK1HTT
SCHEMBL29808111 0.91 ALDH1A1 (0.43) ALDH1A1KDM4ESMN1; SMN2MAPK1HTT
SCHEMBL15037542 0.83 ALDH1A1 (0.42) ALDH1A1KDM4ESMN1; SMN2MAPK1HTT
SCHEMBL2317562 0.83 TP53 (0.45) ALDH1A1KDM4ESMN1; SMN2MAPK1HTT
SCHEMBL29853674 0.83 TP53 (0.45) ALDH1A1KDM4ESMN1; SMN2MAPK1HTT
SCHEMBL9686447 0.81 KIF11 (0.46) ALDH1A1SMN1; SMN2MAPK1GABRPGABRD
SCHEMBL14008509 0.80 KDM4E (0.39) ALDH1A1KDM4ESMN1; SMN2MAPK1HTT
SCHEMBL4646633 0.76 HTR2A (0.54) ALDH1A1KDM4ECYP1A2CYP2C19MEN1
SCHEMBL8821847 0.75 TP53 (0.43) ALDH1A1KDM4ESMN1; SMN2MAPK1HTT
SCHEMBL7918982 0.75 TP53 (0.43) ALDH1A1KDM4ESMN1; SMN2MAPK1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7655386-B2 Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device CHEIL INDUSTRIES, INC. (KR) 2010-02-02 — — US disclosed
US-7655386-B2 Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device CHEIL INDUSTRIES, INC. (KR) 2010-02-02 — — US disclosed
US-20080153033-A1 Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device CHEIL INDUSTRIES, INC. (KR) 2008-06-26 — — US disclosed
US-20080153033-A1 Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device CHEIL INDUSTRIES, INC. (KR) 2008-06-26 — — US disclosed
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