Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | TNNI3 | P19429 | 1/20 | 0.35 |
| ▸ | TNNT2 | P45379 | 1/20 | 0.35 |
| ▸ | TNNC1 | P63316 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 2/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | LDHA | P00338 | 1/20 | 0.34 |
| ▸ | CNR1 | P21554 | 1/20 | 0.34 |
| ▸ | GABRP | O00591 | 1/20 | 0.34 |
| ▸ | GABRD | O14764 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1334758 | 0.92 | ALDH1A1 (0.43) | ALDH1A1KDM4EMAPK1SMN1; SMN2CYP1A2 | |
| SCHEMBL29808111 | 0.92 | ALDH1A1 (0.43) | ALDH1A1KDM4EMAPK1SMN1; SMN2CYP1A2 | |
| SCHEMBL13497451 | 0.83 | ALDH1A1 (0.37) | ALDH1A1KDM4EMAPK1SMN1; SMN2CYP1A2 | |
| SCHEMBL14008509 | 0.81 | KDM4E (0.39) | ALDH1A1KDM4EMAPK1SMN1; SMN2MEN1 | |
| SCHEMBL4646633 | 0.77 | HTR2A (0.54) | ALDH1A1KDM4ECYP1A2CYP2C19MEN1 | |
| SCHEMBL9433474 | 0.75 | KDM4E (0.57) | ALDH1A1KDM4ESMN1; SMN2KMT2AHTT | |
| SCHEMBL14008506 | 0.74 | HTT (0.53) | ALDH1A1KDM4ECYP1A2CYP2C19MEN1 | |
| SCHEMBL4646487 | 0.74 | HSD17B10 (0.43) | ALDH1A1KDM4EMAPK1CYP1A2CYP2C19 | |
| SCHEMBL9686447 | 0.74 | KIF11 (0.46) | ALDH1A1MAPK1SMN1; SMN2CYP1A2CYP2C19 | |
| SCHEMBL11314967 | 0.74 | KDM4E (0.52) | ALDH1A1KDM4EMAPK1SMN1; SMN2CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11320739-B2 | Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate | JSR CORPORATION (JP) | 2022-05-03 | — | — | US | disclosed |
| US-11243468-B2 | Composition for resist underlayer film formation, resist underlayer film and formation method thereof, and patterned substrate production method | JSR CORPORATION (JP) | 2022-02-08 | — | — | US | disclosed |
| US-11215928-B2 | Composition for resist underlayer film formation, resist underlayer film and method for forming the same, and production method of a patterned substrate | JSR CORPORATION (JP) | 2022-01-04 | — | — | US | disclosed |
| US-11126084-B2 | Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound | JSR CORPORATION (JP) | 2021-09-21 | — | — | US | disclosed |
| US-11003079-B2 | Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound | JSR CORPORATION (JP) | 2021-05-11 | — | — | US | disclosed |
| US-20190243247-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING METHOD THEREOF, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND | JSR CORPORATION (JP) | 2019-08-08 | — | — | US | disclosed |
| US-20190212650-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND METHOD FOR FORMING THE SAME, AND PRODUCTION METHOD OF A PATTERNED SUBSTRATE | JSR CORPORATION (JP) | 2019-07-11 | — | — | US | disclosed |
| US-20190094695-A1 | COMPOSITION FOR FILM FORMATION, FILM, RESIST UNDERLAYER FILM-FORMING METHOD, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND | JSR CORPORATION (JP) | 2019-03-28 | — | — | US | disclosed |
| US-9958781-B2 | Method for film formation, and pattern-forming method | JSR CORPORATION (JP) | 2018-05-01 | — | — | US | disclosed |
| US-20180114698-A2 | COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND | JSR CORPORATION (JP) | 2018-04-26 | — | — | US | disclosed |
| US-20170137663-A9 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM, AND PRODUCTION METHOD OF PATTERNED SUBSTRATE | JSR CORPORATION (JP) | 2017-05-18 | — | — | US | disclosed |
| US-9620378-B1 | Composition for film formation, film, production method of patterned substrate, and compound | JSR CORPORATION (JP) | 2017-04-11 | — | — | US | disclosed |
| US-20160314984-A1 | METHOD FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-10-27 | — | — | US | disclosed |
| US-20160257842-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM, AND PRODUCTION METHOD OF PATTERNED SUBSTRATE | JSR CORPORATION (JP) | 2016-09-08 | — | — | US | disclosed |
| US-20160011512-A1 | COMPOSITION, METHOD FOR PRODUCING PATTERNED SUBSTRATE, FILM AND FORMING METHOD THEREOF, AND COMPOUND | JSR CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| US-9091922-B2 | Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming method | JSR CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20150198882-A9 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM AND RESIST UNDERLAYER FILM-FORMING METHOD, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20140272722-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM AND RESIST UNDERLAYER FILM-FORMING METHOD, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140014620-A9 | RESIN COMPOSITION, RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM-FORMING METHOD AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2014-01-16 | — | — | US | disclosed |
| US-20130153535-A1 | RESIN COMPOSITION, RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM-FORMING METHOD AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-06-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20190094695-A1 | COMPOSITION FOR FILM FORMATION, FILM, RESIST UNDERLAYER FILM-FORMING METHOD, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND | RER1, TOP1, RIF1 | ALDH1A1 1845/4885KDM4E 1066/4885MAPK1 2366/4885 |
| US-11003079-B2 | Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound | RER1, TOP1, RIF1 | ALDH1A1 1845/4885KDM4E 1066/4885MAPK1 2366/4885 |
| US-11126084-B2 | Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound | EMG1, FN1, TOP1 | ALDH1A1 849/4885KDM4E 423/4885MAPK1 2804/4885 |
| US-20190243247-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING METHOD THEREOF, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND | EMG1, FN1, TOP1 | ALDH1A1 849/4885KDM4E 423/4885MAPK1 2804/4885 |
| US-20160011512-A1 | COMPOSITION, METHOD FOR PRODUCING PATTERNED SUBSTRATE, FILM AND FORMING METHOD THEREOF, AND COMPOUND | PKN2, FOXK1, SPIN1 | ALDH1A1 1624/4885KDM4E 712/4885MAPK1 1960/4885 |
| US-11215928-B2 | Composition for resist underlayer film formation, resist underlayer film and method for forming the same, and production method of a patterned substrate | TOP1, OXA1L, RER1 | ALDH1A1 826/4885KDM4E 1890/4885MAPK1 1674/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.