SCHEMBL13525825

SCHEMBL13525825

CCC(C)(C(=O)Oc1cc(C(F)(F)F)cc(C(F)(F)F)c1)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 1/20 0.39
▸ CES2 O00748 1/20 0.38
▸ GPR35 Q9HC97 2/20 0.37
▸ RXRA P19793 2/20 0.36
▸ RXRB P28702 2/20 0.36
▸ RXRG P48443 2/20 0.36
▸ NOTUM Q6P988 1/20 0.36
▸ SCN9A Q15858 3/20 0.35
▸ FAAH O00519 2/20 0.35
▸ MAPT P10636 1/20 0.35
▸ TMPRSS4 Q9NRS4 2/20 0.35
▸ P2RX1 P51575 1/20 0.35
▸ SOD1 P00441 1/20 0.34
▸ RHOC P08134 1/20 0.33
▸ RHOA P61586 1/20 0.33
▸ DDR1 Q08345 1/20 0.33
▸ CNR1 P21554 1/20 0.33
▸ PPARD Q03181 1/20 0.33
▸ PPARA Q07869 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12388947 0.91 GPR35 (0.36) ALDH1A1GPR35RXRARXRBRXRG
SCHEMBL2735067 0.84 ALDH1A1 (0.40) ALDH1A1CES2GPR35RXRARXRB
SCHEMBL14924168 0.78 MAPT (0.46) ALDH1A1RXRARXRBMAPT
SCHEMBL16022345 0.78 CYP4F2 (0.37) ALDH1A1MAPTPPARA
SCHEMBL13141956 0.78 ELANE (0.45) ALDH1A1MAPT
SCHEMBL13059564 0.76 RIPK1 (0.40) ALDH1A1RXRARXRBRXRGNOTUM
SCHEMBL106972 0.76 MAPT (0.37) ALDH1A1CES2GPR35RXRARXRB
SCHEMBL2191360 0.75 ESR1 (0.44) ALDH1A1CES2GPR35RXRARXRB
SCHEMBL12108423 0.74 ELANE (0.37) ALDH1A1
SCHEMBL11913011 0.74 ELANE (0.37) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9046766-B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same FUJIFILM CORPORATION (JP) 2015-06-02 — — US disclosed
US-20100009288-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING SAME FUJIFILM CORPORATION (JP) 2010-01-14 — — US disclosed
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