SCHEMBL16022345

SCHEMBL16022345

CCC(C)(C(=O)Oc1cc(C)cc(F)c1)C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP4F2 P78329 1/20 0.37
▸ CYP4A11 Q02928 1/20 0.37
▸ RIPK1 Q13546 1/20 0.34
▸ MAPT P10636 3/20 0.33
▸ ALDH1A1 P00352 1/20 0.33
▸ HPGD P15428 1/20 0.33
▸ ALOX5 P09917 2/20 0.32
▸ HDAC3 O15379 1/20 0.32
▸ HDAC1 Q13547 1/20 0.32
▸ HDAC2 Q92769 1/20 0.32
▸ HDAC8 Q9BY41 1/20 0.32
▸ HDAC6 Q9UBN7 1/20 0.32
▸ POLB P06746 1/20 0.30
▸ ELANE P08246 2/20 0.30
▸ KAT6A Q92794 2/20 0.30
▸ CNR2 P34972 1/20 0.30
▸ LMNA P02545 1/20 0.30
▸ KDM4E B2RXH2 1/20 0.30
▸ ABCB11 O95342 1/20 0.30
▸ CYP1A2 P05177 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12388947 0.84 GPR35 (0.36) MAPTALDH1A1ELANECNR2LMNA
SCHEMBL13525825 0.78 ALDH1A1 (0.39) MAPTALDH1A1PPARA
SCHEMBL13141956 0.74 ELANE (0.45) MAPTALDH1A1POLBELANE
SCHEMBL5967291 0.73 CYP4F2 (0.44) CYP4F2CYP4A11RIPK1MAPTALOX5
SCHEMBL17552765 0.73 RIPK1 (0.46) CYP4F2CYP4A11RIPK1ALOX5ELANE
SCHEMBL14924168 0.72 MAPT (0.46) MAPTALDH1A1ELANELMNAMEN1
SCHEMBL14747378 0.72 ELANE (0.42) MAPTALDH1A1HPGDELANECNR2
SCHEMBL16950367 0.71 CYP4F2 (0.61) CYP4F2CYP4A11MAPTALDH1A1HPGD
SCHEMBL29320483 0.71 CYP4F2 (0.43) CYP4F2CYP4A11MAPTALDH1A1HPGD
SCHEMBL22993645 0.70 EPAS1 (0.32) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8933144-B2 Curable composition for imprint, pattern-forming method and pattern FUJIFILM CORPORATION (JP) 2015-01-13 — — US disclosed
US-20140255662-A1 CURABLE COMPOSITION FOR IMPRINT, PATTERN-FORMING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2014-09-11 — — US disclosed
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