Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL10353591 | 1.00 | FFAR3 (0.50) | — | |
| Acetic Acid SCHEMBL28062376 | 0.94 | FFAR3 (0.44) | — | |
| Acetic Acid SCHEMBL4125009 | 0.91 | FFAR3 (0.41) | — | |
| Bicarbonate SCHEMBL5083789 | 0.89 | — | — | |
| Acetone SCHEMBL11076974 | 0.89 | — | — | |
| Succinic Acid SCHEMBL28098068 | 0.88 | LMNA (0.52) | — | |
| Ether SCHEMBL29049196 | 0.86 | ALDH1A1 (0.41) | — | |
| Oxalic Acid SCHEMBL8730478 | 0.86 | FFAR3 (0.41) | — | |
| Oxalic Acid SCHEMBL29895907 | 0.86 | FFAR3 (0.41) | — | |
| Butanol SCHEMBL1028571 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 192 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8066880-B2 | Apparatus for denitrifying wastewater | HOOT AEROBIC SYSTEMS, INC. (US) | 2011-11-29 | — | — | US | claimed |
| CN-1782873-B | Photosensitive resin composition, preparation method thereof and photosensitive film comprising composition | DONGJIN SEMICOM CO LTD | 2010-07-07 | — | — | CN | claimed |
| US-20090211957-A1 | Apparatus For Denitrifying Wastewater | CORMIER, TROY L. | 2009-08-27 | — | — | US | claimed |
| CN-1782873-A | Photosensitive resin composition and method for preparing the same and photosensitive film comprising the same | DONGJIN SEMICOM CO LTD (KR) | 2006-06-07 | — | — | CN | claimed |
| US-20230189825-A1 | PASTA SOURDOUGH CULTURES AND METHODS OF MAKING SAME | MICROSOUR INDUSTRIES INC. (CA) | 2023-06-22 | — | — | US | disclosed |
| CN-116256944-A | Photosensitive resin composition, photosensitive resin layer using the same, color filter, and display device | 三星SDI株式会社 | 2023-06-13 | — | — | CN | disclosed |
| EP-3723714-B1 | PROPANEDIOL MONOACETATE MONONITRATE | DSM IP ASSETS BV (NL) | 2021-09-29 | — | — | EP | disclosed |
| CN-105408450-B | Method for manufacturing substrate having liquid crystal alignment film for in-plane switching liquid crystal display element | 日产化学工业株式会社 | 2019-11-08 | — | — | CN | disclosed |
| CN-105683829-B | Aligning agent for liquid crystal, liquid crystal orientation film and liquid crystal indicate element | 日产化学工业株式会社 | 2019-08-20 | — | — | CN | disclosed |
| CN-105283802-B | Liquid crystal indicates element, liquid crystal orientation film and aligning agent for liquid crystal | 日产化学工业株式会社 | 2019-08-09 | — | — | CN | disclosed |
| CN-105593751-B | Polymer, polymer composition and the driving liquid crystal of transverse electric field indicate element liquid crystal orientation film | 日产化学工业株式会社 | 2019-07-30 | — | — | CN | disclosed |
| CN-105593308-B | Polymer composition and the driving liquid crystal of transverse electric field indicate element liquid crystal orientation film | 日产化学工业株式会社 | 2019-07-19 | — | — | CN | disclosed |
| CN-1167982-C | Photoresist composition | 住友化学工业株式会社 | 2004-09-22 | — | — | CN | disclosed |
| CN-1235281-A | Photoresist composition | SUMITOMO CHEMICAL CO (JP) | 1999-11-17 | — | — | CN | disclosed |
| CN-1230704-A | Photoresist compositions | SUMITOMO CHEMICAL CO (JP) | 1999-10-06 | — | — | CN | disclosed |
| CN-1200489-A | Donor film for color filter | SAMSUNG DISPLAY DEVICES CO LTD (KR) | 1998-12-02 | — | — | CN | disclosed |
| CN-1091147-A | The polyester-based coating compositions having of high pigment/binder ratio | EXXON CHEMICAL PATENTS INC (US) | 1994-08-24 | — | — | CN | disclosed |
| US-4416976-A | Developer solution for the development of exposed negative-working diazonium salt layers | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-11-22 | — | — | US | disclosed |
| US-4189600-A | ACETYLATION OF OLEINFS, DISSOLVED OXYGEN TO PREVENT GAS BUILDUP | BASF AKTIENGESELLSCHAFT (DE) | 1980-02-19 | — | — | US | disclosed |
| US-4122286-A | Manufacture of glycol esters | BASF AKTIENGESELLSCHAFT (DE) | 1978-10-24 | — | — | US | disclosed |