SCHEMBL13645153

SCHEMBL13645153

CCC(C)C(=O)OC(CC)(CC)C1CCCO1

nearest known ligand 0.36

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.36
LMNA P02545 1/20 0.31
POLB P06746 1/20 0.31
HPGD P15428 1/20 0.31
TSHR P16473 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
TDP1 Q9NUW8 1/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12216114 0.87 HTT (0.38) HTTLMNAPOLBHPGDTSHR
SCHEMBL14617233 0.77 EPHX2 (0.33)
SCHEMBL13645100 0.77 FKBP1A (0.37)
SCHEMBL6367790 0.76 EPHX2 (0.35) ALDH1A1
SCHEMBL76444 0.75 ALDH1A1 (0.37) KMT2AALDH1A1
SCHEMBL74948 0.75 THRB (0.32) HPGDTSHR
SCHEMBL13645269 0.74
SCHEMBL786034 0.74 HTT (0.39) HTTLMNAPOLBHPGDTSHR
SCHEMBL5137057 0.72
SCHEMBL13229829 0.71 EPHX2 (0.33) LMNATSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7601479-B2 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-13 US disclosed
US-7598015-B2 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-06 US disclosed