SCHEMBL13645100

SCHEMBL13645100

CCC(C)(C)C(=O)OC(CC)(CC)C1CCCO1

nearest known ligand 0.37

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
FKBP1A P62942 8/20 0.37
HMGCR P04035 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12216118 0.88 FKBP1A (0.36) FKBP1AHMGCR
SCHEMBL76444 0.81 ALDH1A1 (0.37) FKBP1A
SCHEMBL74948 0.78 THRB (0.32)
SCHEMBL13645153 0.77 HTT (0.36)
SCHEMBL132883 0.76 FKBP1A (0.39) FKBP1AHMGCR
SCHEMBL16744070 0.75 FKBP1A (0.35) FKBP1AHMGCR
SCHEMBL5137057 0.75
SCHEMBL16746670 0.74 HMGCR (0.31) HMGCR
SCHEMBL112273 0.74 FKBP1A (0.38) FKBP1AHMGCR
SCHEMBL16590907 0.74 FKBP1A (0.38) FKBP1AHMGCR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7601479-B2 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-13 US disclosed
US-7598015-B2 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-06 US disclosed