SCHEMBL13645540

SCHEMBL13645540

CCCOC[Si](OC)(OC)OC

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.33
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8861357 0.82 HTT (0.41) LMNA
SCHEMBL915860 0.80 TSHR (0.44) LMNA
SCHEMBL6138142 0.78
SCHEMBL32671404 0.78 HSD17B10 (0.33) HSD17B10
SCHEMBL3872260 0.77 ALDH1A1 (0.30)
SCHEMBL6440852 0.76 LMNA (0.38) HSD17B10LMNA
SCHEMBL32671382 0.76 HSD17B10 (0.32) HSD17B10
SCHEMBL721159 0.72 LMNA (0.44) HSD17B10LMNA
SCHEMBL32671354 0.72 HSD17B10 (0.39) HSD17B10
SCHEMBL32671296 0.72 ALDH1A1 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-4692941-A2 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-02-11 EP disclosed
CN-117529524-A Curable composition and cured product 综研化学株式会社 2024-02-06 CN disclosed
US-7598025-B2 Hologram silver halide photographic material, hologram and method for producing the same KONICA MINOLTA OPTO INC. (JP) 2009-10-06 US disclosed
US-20070172779-A1 Hologram silver halide photographic material, hologram and method for producing the same DAI NIPPON PRINTING CO., LTD. (JP) 2007-07-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SMC1A, SPOUT1, LBR HSD17B10 2021/4885LMNA 2488/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.