Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 4/20 | 0.53 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.53 |
| ▸ | TSHR | P16473 | 3/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.44 |
| ▸ | CASP1 | P29466 | 1/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.42 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | RAB9A | P51151 | 2/20 | 0.39 |
| ▸ | CNR1 | P21554 | 2/20 | 0.39 |
| ▸ | CNR2 | P34972 | 2/20 | 0.39 |
| ▸ | AR | P10275 | 1/20 | 0.38 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.38 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.38 |
| ▸ | HTR6 | P50406 | 1/20 | 0.38 |
| ▸ | ESRRG | P62508 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13385785 | 1.00 | ESR1 (0.53) | ESR1ESR2TSHRMAPK1CYP3A4 | |
| SCHEMBL127692 | 1.00 | ESR1 (0.53) | ESR1ESR2TSHRMAPK1CYP3A4 | |
| SCHEMBL4738363 | 0.98 | ESR1 (0.57) | ESR1ESR2TSHRMAPK1CYP3A4 | |
| SCHEMBL22023062 | 0.98 | ESR1 (0.57) | ESR1ESR2TSHRMAPK1CYP3A4 | |
| SCHEMBL126640 | 0.96 | ESR1 (0.57) | ESR1ESR2TSHRMAPK1CYP3A4 | |
| SCHEMBL29408725 | 0.96 | ESR1 (0.57) | ESR1ESR2TSHRMAPK1CYP3A4 | |
| SCHEMBL1725375 | 0.96 | ESR1 (0.57) | ESR1ESR2TSHRMAPK1CYP3A4 | |
| SCHEMBL8977863 | 0.91 | ESR1 (0.63) | ESR1ESR2TSHRMAPK1CYP3A4 | |
| SCHEMBL137216 | 0.91 | ESR1 (0.63) | ESR1ESR2TSHRMAPK1CYP3A4 | |
| SCHEMBL125232 | 0.91 | TSHR (0.60) | ESR1ESR2TSHRMAPK1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1012 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122079805-A | Preparation method and application of trifluoro-methoxy-amide-containing bridged aromatic amine compound | — | 2026-05-26 | — | — | CN | claimed |
| CN-118184603-A | Diamine monomer containing piperazine unit, polyimide acid salt separation membrane, and preparation method and application thereof | 天津科技大学 | 2024-06-14 | — | — | CN | claimed |
| US-6040418-A | FLUORINATED POLYMIDES COMPRISING UNITS OF 2,2',5,5',6,6'-HEXAFLUOROBIPHENYL-3,3',4,4'-TETRACARBOXYLIC DIANHYDRIDE AND AROMATIC DIAMINE | UBE INDUSTRIES, LTD. (JP) | 2000-03-21 | — | — | US | claimed |
| US-5731125-A | FOR FORMING RESIST FILM | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-03-24 | — | — | US | claimed |
| EP-0558280-A1 | Chemically amplified resist | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-09-01 | — | — | EP | claimed |
| EP-0523957-A1 | Radiation-sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-01-20 | — | — | EP | claimed |
| JP-61271254-A | — | — | None | — | — | JP | disclosed |
| CN-122079805-A | Preparation method and application of trifluoro-methoxy-amide-containing bridged aromatic amine compound | — | 2026-05-26 | — | — | CN | disclosed |
| US-12504687-B2 | Curable photosensitive resin composition, cured product, resist pattern, method of producing resist pattern, semiconductor device and electronic device | ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) | 2025-12-23 | — | — | US | disclosed |
| US-20250346020-A1 | LAMINATE AND DISPLAY | KANEKA CORPORATION (JP) | 2025-11-13 | — | — | US | disclosed |
| EP-3904079-B1 | GAS BARRIER LAMINATE | LINTEC CORP (JP) | 2025-10-29 | — | — | EP | disclosed |
| US-20250320338-A1 | TRANSPARENT FILM, HARD COAT FILM, AND DISPLAY | KANEKA CORPORATION (JP) | 2025-10-16 | — | — | US | disclosed |
| CN-120040805-A | Polyimide film, laminate, and surface material for display | 大日本印刷株式会社 | 2025-05-27 | — | — | CN | disclosed |
| US-5212258-A | Tensile strenght | E. I DU PONT DE NEMOURS AND COMPANY (US) | 1993-05-18 | — | — | US | disclosed |
| US-5212257-A | Aromatic diamines and aromatic dicarboxylic acids condensation | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-05-18 | — | — | US | disclosed |
| WO-1993009161-A1 | ARAMID BLOCK COPOLYMERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-05-13 | — | — | WO | disclosed |
| EP-0523957-A1 | Radiation-sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-01-20 | — | — | EP | disclosed |
| EP-0523240-A1 | BISIMIDE COMPOUNDS, POLYIMIDE RESIN COMPOSITION PREPARED THEREFROM, AND CARBON FIBER-REINFORCED POLYIMIDE RESIN COMPOSITION | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1993-01-20 | — | — | EP | disclosed |
| EP-0463184-A1 | RESIN FOR PROTECTING SEMICONDUCTORS | NIPPON STEEL CHEMICAL CO., LTD. (JP) | 1992-01-02 | — | — | EP | disclosed |
| JP-S61271254-A | PRODUCTION OF ASYMMETRIC BISANILINE CRYSTAL | MITSUI PETROCHEM IND LTD | 1986-12-01 | — | — | JP | disclosed |