SCHEMBL1725375

SCHEMBL1725375

CC(C)(c1ccc(C(C)(C)c2cccc(N)c2)cc1)c1ccc(C(C)(C)c2cccc(N)c2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.57
ESR2 Q92731 3/20 0.57
TSHR P16473 2/20 0.56
MAPK1 P28482 1/20 0.56
CYP3A4 P08684 5/20 0.48
CASP1 P29466 2/20 0.48
RECQL P46063 1/20 0.48
ALDH1A1 P00352 5/20 0.45
CNR1 P21554 2/20 0.41
CNR2 P34972 2/20 0.41
AR P10275 1/20 0.41
HPGD P15428 1/20 0.41
SLC6A2 P23975 1/20 0.41
SLC6A4 P31645 1/20 0.41
HTR6 P50406 1/20 0.41
ESRRG P62508 1/20 0.41
SLC6A3 Q01959 1/20 0.41
HSD17B10 Q99714 1/20 0.41
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29408725 1.00 ESR1 (0.57) ESR1ESR2TSHRMAPK1CYP3A4
SCHEMBL126640 1.00 ESR1 (0.57) ESR1ESR2TSHRMAPK1CYP3A4
SCHEMBL127692 0.96 ESR1 (0.53) ESR1ESR2TSHRMAPK1CYP3A4
SCHEMBL136764 0.96 ESR1 (0.53) ESR1ESR2TSHRMAPK1CYP3A4
SCHEMBL13385785 0.96 ESR1 (0.53) ESR1ESR2TSHRMAPK1CYP3A4
SCHEMBL125232 0.95 TSHR (0.60) ESR1ESR2TSHRMAPK1CYP3A4
SCHEMBL31476400 0.95 TSHR (0.60) ESR1ESR2TSHRMAPK1CYP3A4
SCHEMBL29374282 0.95 TSHR (0.60) ESR1ESR2TSHRMAPK1CYP3A4
SCHEMBL22023062 0.94 ESR1 (0.57) ESR1ESR2TSHRMAPK1CYP3A4
SCHEMBL4738363 0.94 ESR1 (0.57) ESR1ESR2TSHRMAPK1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1829910-B1 LOW WATER-ABSORPTIVE POLYIMIDE RESIN AND METHOD FOR PRODUCING SAME MITSUBISHI GAS CHEMICAL CO (JP) 2011-11-30 EP disclosed
US-7659360-B2 Low water-absorptive polyimide resin and method for producing same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-02-09 US disclosed
US-20080132667-A1 Low Water-Absorptive Polyimide Resin and Method for Producing Same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-06-05 US disclosed
EP-1829910-A1 LOW WATER-ABSORPTIVE POLYIMIDE RESIN AND METHOD FOR PRODUCING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-09-05 EP disclosed