SCHEMBL13683086

SCHEMBL13683086

CCC(C)c1ccc(C)c(OC(=O)c2cccc3ccccc23)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.50
POLB P06746 1/20 0.50
GAA P10253 1/20 0.50
CDC25B P30305 2/20 0.45
ALDH1A1 P00352 2/20 0.43
KDM4E B2RXH2 1/20 0.43
MCL1 Q07820 1/20 0.42
ADRB2 P07550 1/20 0.42
ADRB1 P08588 1/20 0.42
ADRB3 P13945 1/20 0.42
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
CNR1 P21554 3/20 0.42
CNR2 P34972 3/20 0.42
MEN1 O00255 2/20 0.42
MAPT P10636 1/20 0.42
ESR1 P03372 1/20 0.41
ESR2 Q92731 1/20 0.41
TYR P14679 1/20 0.41
UTS2R Q9UKP6 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683087 0.88 GAA (0.60) KMT2APOLBGAACDC25BALDH1A1
SCHEMBL13683077 0.87 KMT2A (0.59) KMT2APOLBGAACDC25BALDH1A1
SCHEMBL13683084 0.86 KMT2A (0.48) KMT2APOLBGAACDC25BALDH1A1
SCHEMBL14461704 0.83 HPGD (0.48) KMT2APOLBGAACDC25BALDH1A1
SCHEMBL11922896 0.73 HTT (0.63) KMT2ANPC1MEN1MAPTESR1
SCHEMBL17424467 0.71 HPGD (0.63) KMT2APOLBGAACDC25BALDH1A1
SCHEMBL31321644 0.71 KMT2A (0.64) KMT2APOLBGAACDC25BALDH1A1
SCHEMBL13898473 0.71 HDAC4 (0.43) KMT2APOLBGAACDC25BALDH1A1
SCHEMBL8367791 0.71 KMT2A (0.78) KMT2APOLBGAAALDH1A1KDM4E
SCHEMBL2114866 0.71 CDC25B (0.52) KMT2APOLBGAACDC25BALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed