SCHEMBL13683087

SCHEMBL13683087

CCC(C)c1ccc(O)c(OC(=O)c2cccc3ccccc23)c1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 4/20 0.60
KMT2A Q03164 3/20 0.60
POLB P06746 1/20 0.60
HDAC4 P56524 1/20 0.43
HDAC2 Q92769 1/20 0.43
HDAC8 Q9BY41 1/20 0.43
CDC25B P30305 1/20 0.42
ADRB2 P07550 2/20 0.42
ADRB1 P08588 2/20 0.42
ADRB3 P13945 2/20 0.42
ALDH1A1 P00352 4/20 0.42
MEN1 O00255 2/20 0.42
MAPT P10636 2/20 0.42
USP2 O75604 1/20 0.42
PKM P14618 1/20 0.42
HPGD P15428 1/20 0.42
ALOX15 P16050 1/20 0.42
HSD17B10 Q99714 1/20 0.42
ESR1 P03372 2/20 0.41
ESR2 Q92731 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683077 0.92 KMT2A (0.59) GAAKMT2APOLBHDAC4HDAC2
SCHEMBL13683086 0.88 KMT2A (0.50) GAAKMT2APOLBCDC25BADRB2
SCHEMBL13683084 0.86 KMT2A (0.48) GAAKMT2APOLBCDC25BADRB2
SCHEMBL14461704 0.83 HPGD (0.48) GAAKMT2APOLBCDC25BADRB2
SCHEMBL13683079 0.80 ADRB2 (0.43) GAAKMT2APOLBHDAC4HDAC2
SCHEMBL27697453 0.79 KMT2A (0.73) GAAKMT2APOLBALDH1A1MEN1
SCHEMBL13898473 0.79 HDAC4 (0.43) GAAKMT2APOLBHDAC4HDAC2
SCHEMBL27773732 0.76 KMT2A (1.00) GAAKMT2APOLBHDAC8ALDH1A1
SCHEMBL9908607 0.75 GAA (0.54) GAAKMT2AHDAC4HDAC2HDAC8
SCHEMBL683263 0.74 HPGD (0.53) GAAHDAC4HDAC2HDAC8ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed