SCHEMBL13683077

SCHEMBL13683077

CCC(C)c1ccc(OC(=O)c2cccc3ccccc23)c(O)c1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.59
GAA P10253 3/20 0.59
POLB P06746 1/20 0.59
CNR1 P21554 4/20 0.44
CNR2 P34972 4/20 0.44
CYP2C9 P11712 2/20 0.42
HDAC4 P56524 1/20 0.42
HDAC2 Q92769 1/20 0.42
HDAC8 Q9BY41 1/20 0.42
CDC25B P30305 2/20 0.41
ADRB2 P07550 1/20 0.41
ADRB1 P08588 1/20 0.41
ADRB3 P13945 1/20 0.41
MAPT P10636 2/20 0.41
MEN1 O00255 2/20 0.41
ALDH1A1 P00352 3/20 0.41
HTT P42858 2/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
ALOX12 P18054 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683087 0.92 GAA (0.60) KMT2AGAAPOLBCNR1CNR2
SCHEMBL13683084 0.87 KMT2A (0.48) KMT2AGAAPOLBCNR1CNR2
SCHEMBL13683086 0.87 KMT2A (0.50) KMT2AGAAPOLBCNR1CNR2
SCHEMBL14461704 0.82 HPGD (0.48) KMT2AGAAPOLBCNR1CNR2
SCHEMBL11277748 0.81 ADRB2 (0.55) KMT2AGAAPOLBCYP2C9ADRB2
Hydrochloric Acid SCHEMBL11277742 0.81 ADRB2 (0.54) KMT2AGAAPOLBCYP2C9ADRB2
SCHEMBL13683062 0.80 HDAC4 (0.44) KMT2AGAAHDAC4HDAC2HDAC8
SCHEMBL13683078 0.80 ADRB2 (0.42) KMT2AGAAPOLBHDAC4HDAC2
SCHEMBL11281895 0.76 KMT2A (0.54) KMT2AGAAPOLBCNR1CNR2
SCHEMBL11922869 0.76 ALDH1A1 (0.49) KMT2AGAAHDAC4HDAC2HDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed