Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | SMPD1 | P17405 | 3/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | S1PR2 | O95136 | 1/20 | 0.30 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.30 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13713630 | 0.91 | TP53 (0.36) | TP53SMPD1 | |
| SCHEMBL13713624 | 0.90 | TP53 (0.35) | TP53SMPD1 | |
| SCHEMBL13713629 | 0.82 | RECQL (0.32) | — | |
| SCHEMBL13266719 | 0.80 | LMNA (0.34) | TP53MAPT | |
| SCHEMBL13266558 | 0.80 | LMNA (0.34) | TP53MAPT | |
| SCHEMBL13988737 | 0.79 | TP53 (0.33) | TP53MAPT | |
| SCHEMBL111792 | 0.79 | S1PR3 (0.42) | TP53S1PR3 | |
| SCHEMBL132223 | 0.79 | S1PR3 (0.42) | TP53S1PR3 | |
| SCHEMBL2757707 | 0.79 | S1PR3 (0.42) | TP53S1PR3 | |
| SCHEMBL683694 | 0.79 | S1PR3 (0.42) | TP53S1PR3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592126-B2 | Positive resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-7465528-B2 | Positive-working photosensitive composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2008-12-16 | — | — | US | disclosed |
| US-7341817-B2 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-03-11 | — | — | US | disclosed |