SCHEMBL13713629

SCHEMBL13713629

CCCCC(C)C(COc1c(F)c(F)c(S(=O)(=O)O)c(F)c1F)C(C)CC

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
RECQL P46063 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13713624 0.93 TP53 (0.35)
SCHEMBL13713630 0.91 TP53 (0.36)
SCHEMBL13713623 0.82 TP53 (0.36)
SCHEMBL13713659 0.80 CA12 (0.37)
SCHEMBL3749145 0.75 LMNA (0.32)
SCHEMBL14278399 0.73 CA1 (0.38)
SCHEMBL13713660 0.72 CA12 (0.37)
SCHEMBL13988737 0.72 TP53 (0.33) RECQL
SCHEMBL111792 0.71 S1PR3 (0.42) RECQL
SCHEMBL132223 0.71 S1PR3 (0.42) RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592126-B2 Positive resist composition and pattern forming method using the resist composition FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-7465528-B2 Positive-working photosensitive composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2008-12-16 US disclosed
US-7341817-B2 Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition FUJIFILM CORPORATION (JP) 2008-03-11 US disclosed