SCHEMBL137175

SCHEMBL137175

C=C(C)C=CS(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2402479 1.00
SCHEMBL3730583 0.91 ALDH1A1 (0.46)
Acrylic Acid SCHEMBL7864513 0.87 LMNA (0.42)
Potassium Ion SCHEMBL868103 0.81 ALDH1A1 (0.32)
SCHEMBL151696 0.81 ALDH1A1 (0.33)
SCHEMBL3902221 0.80 ALDH1A1 (0.35)
Styrene SCHEMBL2244944 0.78 ALDH1A1 (0.47)
Styrene SCHEMBL4262472 0.76 ALDH1A1 (0.45)
SCHEMBL3905772 0.76
SCHEMBL10938344 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2119 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260008938-A1 POLISHING COMPOSITION FUJIMI INC (JP) 2026-01-08 US claimed
US-20250271932-A1 COMPOSITIONS AND DEVICES FOR WEARABLE ELECTRODES AND RELATED METHODS OF FABRICATION BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM 2025-08-28 US claimed
CN-120127239-A Hydrogel electrolyte, preparation method thereof and zinc ion battery 维特新能(广东)科技有限公司 2025-06-10 CN claimed
CN-119639349-A Polishing composition, preparation method and application thereof 深圳市鑫鸿达清洗技术有限公司 2025-03-18 CN claimed
EP-4508663-A1 COMPOSITIONS AND DEVICES FOR WEARABLE ELECTRODES AND RELATED METHODS OF FABRICATION Board of Regents, The University of Texas System (US) 2025-02-19 EP claimed
CN-118955787-A Preparation method of VDC-AN composition 浙江衢州巨塑化工有限公司 2024-11-15 CN claimed
CN-118812775-A VDC-AN composition 浙江衢州巨塑化工有限公司 2024-10-22 CN claimed
CN-118420956-A Release film 东丽尖端素材株式会社 2024-08-02 CN claimed
CN-115772281-B Release film 东丽尖端素材株式会社 2024-06-18 CN claimed
CN-116096822-B Release coating composition 东丽尖端素材株式会社 2024-05-31 CN claimed
EP-0586383-A4 BREAKER CHEMICAL ENCAPSULATED WITH A CROSSLINKED ELASTOMER COATING EXXON RESEARCH ENGINEERING CO (US) 1994-05-18 EP claimed
EP-0639241-A4 ENCAPSULATED BREAKER CHEMICAL. EXXON RESEARCH ENGINEERING CO (US) 1994-03-31 EP claimed
EP-0586383-A1 BREAKER CHEMICAL ENCAPSULATED WITH A CROSSLINKED ELASTOMER COATING EXXON RESEARCH AND ENGINEERING COMPANY (US) 1994-03-16 EP claimed
EP-0585228-A1 ENCAPSULATED BREAKER CHEMICAL WITH A MULTI-COAT LAYER UREA EXXON RESEARCH AND ENGINEERING COMPANY (US) 1994-03-09 EP claimed
WO-1992017683-A1 BREAKER CHEMICAL ENCAPSULATED WITH A CROSSLINKED ELASTOMER COATING EXXON RESEARCH AND ENGINEERING COMPANY (US) 1992-10-15 WO claimed
WO-1992012328-A1 ENCAPSULATED BREAKER CHEMICAL WITH A MULTI-COAT LAYER UREA EXXON RESEARCH AND ENGINEERING COMPANY (US) 1992-07-23 WO claimed
WO-1992012327-A1 ENCAPSULATED BREAKER CHEMICAL EXXON RESEARCH AND ENGINEERING COMPANY (US) 1992-07-23 WO claimed
US-5110486-A Neutralized sulfonated elastomeric copolymer; sustained release EXXON RESEARCH AND ENGINEERING COMPANY (US) 1992-05-05 US claimed
US-5102558-A Neutralized sulfonated elastomers EXXON RESEARCH AND ENGINEERING COMPANY (US) 1992-04-07 US claimed
US-5102559-A Particulate breaker composition sealed with a water soluble layer and coated with a neutralized sulfonated elastomeric polymer for fracturing subterranean formations EXXON RESEARCH AND ENGINEERING COMPANY (US) 1992-04-07 US claimed