Known targets — ChEMBL curated mechanism
AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA
The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL151696 | 0.95 | ALDH1A1 (0.33) | ALDH1A1TP53TSHR | |
| SCHEMBL2402479 | 0.81 | — | — | |
| SCHEMBL137175 | 0.81 | — | — | |
| SCHEMBL3902221 | 0.78 | ALDH1A1 (0.35) | ALDH1A1TP53TSHR | |
| SCHEMBL3905772 | 0.74 | — | — | |
| SCHEMBL3730583 | 0.73 | ALDH1A1 (0.46) | ALDH1A1TP53TSHR | |
| SCHEMBL604305 | 0.72 | ALDH1A1 (0.30) | ALDH1A1TP53TSHR | |
| Acrylic Acid SCHEMBL7864513 | 0.70 | LMNA (0.42) | ALDH1A1TP53TSHR | |
| Potassium Ion SCHEMBL17476639 | 0.67 | — | — | |
| SCHEMBL19522271 | 0.67 | ALDH1A1 (0.30) | ALDH1A1TP53TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9243180-B2 | Filtration control agent and a drilling fluid containing the same | CHINA PETROLEUM & CHEMICAL CORPORATION (CN) | 2016-01-26 | — | — | US | disclosed |
| US-8623791-B2 | Copolymer and preparation method and application thereof | CHINA PETROLEUM & CHEMICAL CORPORATION (CN) | 2014-01-07 | — | — | US | disclosed |
| US-20130079256-A1 | Filtration Control Agent And A Drilling Fluid Containing The Same | SINOPEC RESEARCH INSTITUTE OF PETROLEUM ENGINEERING (CN) | 2013-03-28 | — | — | US | disclosed |
| US-20130079257-A1 | DISPERSANT AND A DRILLING FLUID CONTAINING THE SAME | SINOPEC RESEARCH INSTITUTE OF PETROLEUM ENGINEERING (CN) | 2013-03-28 | — | — | US | disclosed |
| US-20120077718-A1 | COPOLYMER AND PREPARATION METHOD AND APPLICATION THEREOF | SINOPEC RESEARCH INSTITUTE OF PETROLEUM ENGINEERING (CN) | 2012-03-29 | — | — | US | disclosed |
| US-6559056-B2 | Inorganic abrasive and organic particles with anionic group, wherein the removal rate for silicon oxide film is at least 5 times the removal rate for silicon nitride film; used for a shallow trench isolation in semiconductor manufacturing | JSR CORPORATION (JP) | 2003-05-06 | — | — | US | disclosed |
| US-20020011031-A1 | Aqueous dispersion for chemical mechanical polishing | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1160300-A2 | Aqueous dispersion for chemical mechanical polishing | JSR Corporation (JP) | 2001-12-05 | — | — | EP | disclosed |