SCHEMBL1373330

SCHEMBL1373330

CC1(C(=O)c2ccccc2)C=CC(C(=O)C2=CCC(C)(C(=O)c3ccccc3)C=C2)=CC1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.37
ALDH1A1 P00352 1/20 0.35
GABRA1 P14867 1/20 0.34
GABRB1 P18505 1/20 0.34
MAPK1 P28482 1/20 0.34
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
BCL2 P10415 1/20 0.32
MCL1 Q07820 1/20 0.32
CES2 O00748 2/20 0.32
CES1 P23141 2/20 0.32
L3MBTL1 Q9Y468 2/20 0.32
ATM Q13315 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
SRD5A2 P31213 1/20 0.32
PTGES O14684 1/20 0.32
ALOX5 P09917 1/20 0.32
DAO P14920 1/20 0.31
TSHR P16473 1/20 0.31
NAPRT Q6XQN6 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27911914 0.95 ALDH1A1 (0.38) LMNAALDH1A1GABRA1GABRB1MAPK1
SCHEMBL28401610 0.87 LMNA (0.35) LMNAMAPK1MEN1KMT2ACES2
SCHEMBL13704018 0.83 LMNA (0.38) LMNAALDH1A1MAPK1MEN1KMT2A
SCHEMBL25432673 0.83 LMNA (0.38) LMNAALDH1A1GABRA1GABRB1MAPK1
SCHEMBL28994660 0.81 LMNA (0.37) LMNAALDH1A1MAPK1MEN1KMT2A
SCHEMBL5320073 0.80 LMNA (0.36) LMNAALDH1A1MAPK1MEN1KMT2A
Hydrogen Sulfide SCHEMBL27540779 0.79 LMNA (0.36) LMNAMAPK1MEN1KMT2ACES2
SCHEMBL13704021 0.78 LMNA (0.35) LMNAALDH1A1MAPK1MEN1KMT2A
SCHEMBL13704033 0.78 CES1 (0.35) LMNAALDH1A1MAPK1MEN1KMT2A
SCHEMBL2470211 0.78 ALDH1A1 (0.42) ALDH1A1GABRA1GABRB1MAPK1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260110965-A1 PHOTOSENSITIVE RESIN COMPOSITION, INSULATING FILM, AND SEMICONDUCTOR DEVICE LG CHEMICAL LTD (KR) 2026-04-23 US disclosed
EP-4582871-A1 PHOTOSENSITIVE RESIN COMPOSITION, INSULATING FILM, AND SEMICONDUCTOR DEVICE LG CHEM, LTD. (KR) 2025-07-09 EP disclosed
CN-112368641-B Photosensitive resin composition, photosensitive sheet, cured film thereof, method for producing cured film, and electronic component 东丽株式会社 2025-05-02 CN disclosed
WO-2024237532-A1 PHOTOSENSITIVE RESIN COMPOSITION, INSULATING FILM, AND SEMICONDUCTOR DEVICE 주식회사 엘지화학 2024-11-21 WO disclosed
WO-2024203435-A1 METHOD FOR PRODUCING TRANSFER LAMINATE, TRANSFER LAMINATE, AND SEMICONDUCTOR DEVICE PRODUCTION METHOD 東レ株式会社 2024-10-03 WO disclosed
US-20240045329-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND COMPOUND TORAY INDUSTRIES, INC. (JP) 2024-02-08 US disclosed
CN-116802559-A Photosensitive resin composition, cured film, electronic component, antenna element, semiconductor package, and compound 东丽株式会社 2023-09-22 CN disclosed
EP-3284771-B1 HEAT-RESISTANT RESIN COMPOSITION, METHOD FOR MANUFACTURING HEAT-RESISTANT RESIN FILM, METHOD FOR MANUFACTURING INTERLAYER INSULATION FILM OR SURFACE PROTECTIVE FILM, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT OR SEMICONDUCTOR COMPONENT TORAY INDUSTRIES (JP) 2023-08-30 EP disclosed
EP-3627212-B1 CONTACT LENS COMPOSITION, AND CONTACT LENS AND METHOD FOR MANUFACTURING SAME TORAY INDUSTRIES (JP) 2023-07-26 EP disclosed
CN-116323755-A Resin composition, cured film, insulating film or protective film, antenna element, electronic component, display device or semiconductor device, and method for producing same 东丽株式会社 2023-06-23 CN disclosed
US-8013528-B2 Plasma display member and method for manufacturing plasma display member TORAY INDUSTRIES, INC. (JP) 2011-09-06 US disclosed
EP-2360194-A1 SILOXANE RESIN COMPOSITION AND PROTECTIVE FILM FOR TOUCH PANEL USING SAME Toray Industries, Inc. (JP) 2011-08-24 EP disclosed
US-20100283374-A1 PLASMA DISPLAY MEMBER AND METHOD FOR MANUFACTURING PLASMA DISPLAY MEMBER TORAY INDUSTRIES, INC. (JP) 2010-11-11 US disclosed
US-20090142703-A1 Display Member Exposing Method and Plasma Display Member Manufacturing Method TORAY INDUSTRIES, INC. (JP) 2009-06-04 US disclosed
US-7411780-B2 Paste, display member, and process for production of display member TORAY INDUSTRIES, INC. (JP) 2008-08-12 US disclosed
EP-1158019-B1 Paste, display member, and process for production of display member TORAY INDUSTRIES (JP) 2007-12-26 EP disclosed
US-7004812-B2 Paste, display member, and process for production of display member TORAY INDUSTRIES, INC. (JP) 2006-02-28 US disclosed
US-20050079447-A1 Paste, display member, and process for production of display member TORAY INDUSTRIES, INC. (JP) 2005-04-14 US disclosed
US-20020008470-A1 Paste, display member, and process for production of display member TORAY INDUSTRIES INC. (JP) 2002-01-24 US disclosed
EP-1158019-A2 Paste, display member, and process for production of display member TORAY INDUSTRIES, INC. (JP) 2001-11-28 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260110965-A1 PHOTOSENSITIVE RESIN COMPOSITION, INSULATING FILM, AND SEMICONDUCTOR DEVICE ARID2, TAS2R4, SMC4 LMNA 4074/4885ALDH1A1 1217/4885GABRA1 1465/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.