Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | RARA | P10276 | 2/20 | 0.34 |
| ▸ | RARB | P10826 | 2/20 | 0.34 |
| ▸ | RARG | P13631 | 2/20 | 0.34 |
| ▸ | RXRA | P19793 | 1/20 | 0.34 |
| ▸ | NR2E1 | Q9Y466 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | KMO | O15229 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.31 |
| ▸ | CES2 | O00748 | 4/20 | 0.31 |
| ▸ | CES1 | P23141 | 4/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | DAO | P14920 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Sulfide SCHEMBL27540779 | 0.98 | LMNA (0.36) | LMNARARARARBRARGRXRA | |
| Sulfurous Acid SCHEMBL27760712 | 0.96 | LMNA (0.34) | LMNARARARARBRARGRXRA | |
| SCHEMBL4371622 | 0.86 | RARA (0.33) | LMNARARARARBRARGRXRA | |
| SCHEMBL28768953 | 0.86 | RARA (0.33) | LMNARARARARBRARGRXRA | |
| SCHEMBL19746580 | 0.82 | MEN1 (0.42) | MAPTSMN1; SMN2MEN1KMT2ATSHR | |
| SCHEMBL25432673 | 0.81 | LMNA (0.38) | LMNAMAPK1MEN1KMT2ACES2 | |
| SCHEMBL13704018 | 0.81 | LMNA (0.38) | LMNAMAPK1SMN1; SMN2MEN1KMT2A | |
| SCHEMBL28908500 | 0.81 | RARA (0.31) | RARARARBRARGRXRANR2E1 | |
| SCHEMBL1373330 | 0.80 | LMNA (0.37) | LMNAMAPK1MEN1KMT2ACES2 | |
| SCHEMBL28994660 | 0.80 | LMNA (0.37) | LMNAMAPK1MEN1KMT2ACES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1780747-A2 | A conductive electrode powder, a method for preparing the same, and uses thereof | Samsung SDI Co., Ltd. (KR) | 2007-05-02 | — | — | EP | claimed |
| EP-3778039-B1 | DIGITAL PRINTING INKS | SUN CHEMICAL CORP (US) | 2022-04-06 | — | — | EP | disclosed |
| EP-3778039-A1 | DIGITAL PRINTING INKS | Sun Chemical Corporation (US) | 2021-02-17 | — | — | EP | disclosed |
| EP-3110893-B1 | DIGITAL PRINTING INKS | SUN CHEMICAL CORP (US) | 2020-12-23 | — | — | EP | disclosed |
| CN-105474096-B | Radiation-sensitive resin composition, resin film, and electronic component | 日本瑞翁株式会社 | 2019-11-12 | — | — | CN | disclosed |
| CN-106497499-B | A kind of UV solidification optical cement | 南京汇鑫光电材料有限公司 | 2019-07-12 | — | — | CN | disclosed |
| CN-109789715-A | Use the manufacturing method and lithographic printing ink sets of the printed article of lithographic printing ink | 东丽株式会社 | 2019-05-21 | — | — | CN | disclosed |
| CN-109734636-A | A kind of preparation method of 4- benzoyl -4 '-methyl-diphenyl sulfide | 天津久日新材料股份有限公司 | 2019-05-10 | — | — | CN | disclosed |
| CN-105993065-B | The manufacturing method of semiconductor element | 国立大学法人东北大学 | 2019-03-08 | — | — | CN | disclosed |
| CN-105723468-B | Scintillator panel | 东丽株式会社 | 2019-01-22 | — | — | CN | disclosed |
| CN-106569389-A | Self-luminescent photosensitive resin composition, color filter and image display device including the color filter | 东友精细化工有限公司 | 2017-04-19 | — | — | CN | disclosed |
| CN-106497499-A | A kind of UV solidifies optical cement | 南京汇鑫光电材料有限公司 | 2017-03-15 | — | — | CN | disclosed |
| CN-104254442-B | GAS BARRIER FILM, SUBSTRATE FOR ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | 柯尼卡美能达株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-105916907-A | Polyurethane compound and resin composition containing same, cured product of said resin composition, and method for producing said resin composition | 日本化药株式会社 | 2016-08-31 | — | — | CN | disclosed |
| CN-102795013-B | Manufacture method for hectographic printing with basement membrane, this duplexer and the basement membrane of duplexer | THE NIPPON SYNTHETIC CHEMICAL INDUSTRY CO., LTD. (JP) | 2016-05-04 | — | — | CN | disclosed |
| CN-1707358-B | Photosensitive resin composition | SUMITOMO CHEMICAL CO | 2010-09-01 | — | — | CN | disclosed |
| CN-101384958-A | Cationic compositions and methods of making and using the same | DSM IP ASSETS BV (NL) | 2009-03-11 | — | — | CN | disclosed |
| CN-1707358-A | Photosensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2005-12-14 | — | — | CN | disclosed |
| CN-1181040-C | Fumarate derivative and process for producing the same | 昭和电工株式会社 | 2004-12-22 | — | — | CN | disclosed |
| CN-1386116-A | Fumarate derivative, method for producing the same | SHOWA DENKO KK (JP) | 2002-12-18 | — | — | CN | disclosed |