SCHEMBL13744455

SCHEMBL13744455

CCC(C)(F)C(=O)OCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.31
KDM4E B2RXH2 1/20 0.31
POLB P06746 1/20 0.31
MAPT P10636 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13744393 0.98 KDM4E (0.31) KDM4EPOLBMAPTKMT2A
SCHEMBL14887175 0.86 THRB (0.31) THRBKDM4EPOLBMAPTKMT2A
SCHEMBL12939354 0.85
SCHEMBL13744091 0.85 THRB (0.31) THRBKDM4EPOLBMAPTKMT2A
SCHEMBL13744335 0.83 KDM4E (0.31) KDM4EPOLBMAPTKMT2A
SCHEMBL13823140 0.82
SCHEMBL21303906 0.82 PRKCA (0.35) THRBKDM4EPOLBMAPTKMT2A
SCHEMBL4938325 0.81 CA2 (0.33) THRBMAPT
SCHEMBL13744093 0.80 TSHR (0.36) KDM4EMAPT
SCHEMBL12939363 0.79 LMNA (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7569323-B2 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-04 US disclosed