SCHEMBL13758587

SCHEMBL13758587

COCOC(C1CC2CCC1C2)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
SLC6A3 Q01959 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12761121 0.84 EPHX2 (0.31)
SCHEMBL6861923 0.81 SLC6A3 (0.34) SLC6A3
SCHEMBL13758586 0.73 ALDH1A1 (0.41)
SCHEMBL12928195 0.73
SCHEMBL9908447 0.72
SCHEMBL14491133 0.71
SCHEMBL13764366 0.70
SCHEMBL14491166 0.69
SCHEMBL15733207 0.68 SLC6A3 (0.33) SLC6A3
SCHEMBL12761102 0.68 BRS3 (0.38) SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7579131-B2 Positive resist composition and method of forming resist pattern using the same FUJIFILM CORPORATION (JP) 2009-08-25 US disclosed